2013
*
Yisheng Xu, Lin Chen, Yushi (Russell) Zhao, Larry M. Cathles,
Christopher K. Ober, ?œSupercritical CO2-philic Nanoparticles: A
Prospective Tracer for Subsurface Mapping of Shales?? Energy &
Environmental Science, submitted.
*
M. Elizabeth Welch, Nicole L. Ritzert, Hongjun Chen, Norah L.
Smith Michele E. Tague, Youyong Xu, Barbara A. Baird, Héctor D.
Abruña, and Christopher K. Ober, "A Generalized Platform for Antibody
Detection using the Antibody Catalyzed Water Oxidation Pathway", JACS,
in preparation.
*
Kryask, Marie; Trikeriotis, Markos; Ouyang, Christine; Chakrabarty,
Souvik; Giannelis, Emmanuel P.; Ober, Christopher K., Journal of
Photopolymer Science and Technology (2013), 26(5), 659-664.
*
M. Elizabeth Welch, Thomas Doublet, Christophe Bernard, George
Malliaras, and Christopher K. Ober, "Stable immobilization of an enzyme
on an organic transistor via a polymer brush", Adv. Mater., submitted.
*
Lin Chen, Héloïse Thérien-Aubin, Mavis C.Y. Wong, Eric M.V. Hoek,
Christopher K. Ober, "Improved Antifouling Properties of Polymer
Membranes Using 'Layer-by-layer' Mediated Method", JMC B, in revision.
*
M. Elizabeth Welch, C. K. Ober, ?œResponsive and patterned polymer
brushes?? J. Polym. Sci.: Physics, in press.
*
Carol Newby, Jin-Kyun Lee and Christopher K. Ober, "Inkjet Printing of
Fluorinated Materials and their Application to Patterning Organic
Semiconductors", JMC C, in press.
*
Christian Ohm and Christopher K. Ober, ?œFrom surface coatings to
polymer nanoparticles: lifting off polymer brushes?? RSC Advances, in
press.
*
Christopher K. Ober, ?œInitiatives in Global Chemical Education ??The
continuing celebration of IYC 2011: What the IUPAC Polymer Division is
doing to keep things going?? J. Chem. Ed., in press.
*
Wieberger, Florian; Kolb, Tristan; Neuber, Christian; Ober, Christopher
K.; Schmidt, Hans-Werner, ?œCombinatorial techniques to efficiently
investigate and optimize organic thin film processing and properties??
Molecules (2013), 18, 4120-4139.
*
Wan, Alwin M. D.; Chandler, Emily M.; Madhavan, Maya; Infanger, David
W.; Ober, Christopher K.; Gourdon, Delphine; Malliaras, George G.;
Fischbach, Claudia, ?œFibronectin conformation regulates the
proangiogenic capability of tumor-associated adipogenic stromal cells??
Biochimica et Biophysica Acta, General Subjects (2013), 1830(9),
4314-4320.
*
Newby, Carol; Lee, Jin-Kyun; Ober, Christopher K., ?œThe solvent
problem: Redissolution of macromolecules in solution-processed organic
electronics?? Macromolecular Research (2013), 21(3), 248-256.
*
Jones, Richard G.; Ober, Christopher K.; Hodge, Philip; Kratochvil,
Pavel; Moad, Graeme; Vert, Michel; IUPAC Commission, ?œTerminology for
aggregation and self-assembly in polymer science (IUPAC Recommendations
2013)?? Pure and Applied Chemistry (2013), 85(2), 463-492.
*
Andrew B. Holmes, Jin-Kyun Lee, Georgia E. McCluskey, Christopher K.
Ober, Scott E. Watkins, Wallace W. H. Wong, "Semi-Perfluoroalkyl
Polyfluorene with Varying Fluorine Content: Synthesis and Photophysical
Properties", Polymer Chemistry, in press.
*
Midthun, Kari; Taylor, Priscilla; Newby, Carol;
Chatzichristidi, Margarita; Petrou, Panagiota; Lee, Jin-Kyun;
Kakabakos, Sotirios; Baird, Barbara; Ober, Christopher, "Orthogonal
Patterning of Multiple Biomolecules Using an Organic Fluorinated Resist
and Imprint Lithography", Biomacromolecules, (2013), 14(4), 993-1002.
*
Florian Wieberger, Christian Neuber, Christopher K. Ober, and
Hans-Werner Schmidt, ?œTailored Star Block Copolymer Architecture for
High Performance Chemically Amplified Resists?? Advanced Materials,
2013, 24(44) 5939-.
*
M. E. Welch, C.K. Ober, "Characterization of Polymer Brush Membranes
via HF Etch Liftoff Technique", ACS Macro Letters, 2013 2(3) 241-245.
*
Yosuke Hoshi, Youyong Xu, Christopher K. Ober, ?œPhoto-cleavable,
anti-fouling polymer brushes: a simple and versatile platform for
multicomponent protein patterning?? Polymer, 2013, 54(7), 1762-1767.
*
Sun, Wenjie; Gamez, Victor M.; Otero-Gonzalez, Lila, Cho,
Youngjin, Christopher K Ober, Reyes Sierra-Alvarez, "Biodegradability,
Cytotoxicity, and Physicochemical Treatability of Two Novel
Perfluorooctane Sulfonate-Free Photoacid Generators", Archives of
Environmental Contamination and Toxicology, 64(2), 187-197, 2013
*
Congdon, Robert B.; Feldberg, Alexander S.; Ben-Yakar, Natalie; et al.,
"Early detection of Candida albicans biofilms at porous electrodes",
Analytical Biochemistry 433(2), 192-201, 2013
*
Z. Zhou, P. Yu, H. M. Geller and C. K. Ober, ?œPatterned polymer brush
containing tethered acetylcholine analogues to guide hippocampal
neuronal adhesion and neurite growth?? Biomacromolecules, 14(2),
529-537, 2013.
2012
*
Kolb, Tristan; Neuber, Christian; Krysak, Marie; Ober, Christopher K.;
Schmidt, Hans-Werner, "Multicomponent Physical Vapor Deposited Films
with Homogeneous Molecular Material Distribution Featuring Improved
Resist Sensitivity", Advanced Functional Materials (2012), 22(18),
3865-3873.
Ohm, C.; Welch, M. E.; Ober, C. K., "Materials for Biosurfaces", Journal of Materials Chemistry (2012), 22(37), 19343-19347
Welch, M.
Elizabeth; Xu, Youyong; Chen, Hongjun; Smith, Norah; Tague, Michele E.;
Abruna, Hector D.; Baird, Barbara; Ober, Christopher K., "Polymer
brushes as functional, patterned surfaces for nanobiotechnology",
Journal of Photopolymer Science and Technology (2012), 25(1), 53.
Rina Maeda,
Michelle Chavis, Nam-Ho You, Christopher K. Ober, ?œTop-down meets
bottom up: block copolymers with photoreactive segments?? Journal of
Photopolymer Science and Technology 25(1), 17, 2012.
Markos
Trikeriotis, Marie Krysak, Yeon Sook Chung, Christine Ouyang, Brian
Cardineau, Robert Brainard, Christopher K. Ober, Emmanuel P. Giannelis,
Kyoungyong Cho, ?œNanoparticle photoresists from HfO2 and ZrO2 for EUV
patterning?? Journal of Photopolymer Science and Technology, 25(5),
583, 2012.
*
Gilda Shayan, Nelson Felix, Youngjin Cho, Margarita Chatzichristidi,
Michael L. Shuler, Christopher K. Ober and Kelvin H. Lee, "Synthesis
and Characterization of High-Throughput Nanofabricated Poly(4-Hydroxy
Styrene) Membranes for In Vitro Models of Barrier Tissue", Tissue
Engineering: Part C: Methods (2012), 18(9), 667-676.
*
Youngjin Cho, Harihara S. Sundaram, John A. Finlay, Michael D.
Dimitriou, Maureen E. Callow, James A. Callow, Edward J. Kramer
and Christopher K. Ober, "Reconstruction of Surfaces from Mixed
Hydrocarbon and PEG Components in Water: Responsive Surfaces Aid
Fouling Release", Biomacromolecules, (2012), 13(6), 1864-1874.
*
Jung, Byungki; Sha, Jing; Paredes, Florencia; Chandhok, Manish;
Younkin, Todd; Wiesner, Ulrich; Ober, Christopher; Thompson, Michael,
"Kinetic Rates of Thermal Transformations and Diffusion in Polymer
Systems Measured during Sub-Millisecond Laser-Induced Heating", ACS
Nano, (2012), 6(7), 5830-5836.
*
Prabhu Vivek M.; Kang Shuhui; Sha Jing; et al., "Neutron Reflectivity
Characterization of the Photoacid Reaction-Diffusion Latent and
Developed Images of Molecular Resists for Extreme Ultraviolet
Lithography", Langmuir, 2012, 28(20), 7665-7678
*
Cho, Youngjin; Cho, Daehwan; Park, Jay Hoon; Frey, Margaret W.; Ober,
Christopher K.; Joo, Yong Lak, ?œPreparation and characterization of
amphiphilic triblock terpolymer-based nanofibers as antifouling
biomaterials?? Biomacromolecules, 2012 13(5), 1606-1614.
*
Alwin Wan, Rebecca Schur, Christopher K. Ober, Claudia Fischbach,
Delpine Gourdon and G. G. Malliaras, ?œElectrical control of protein
conformation?? Advanced Materials, (2012), 24(18), 2501-2505.
Rina Maeda, Michelle Chavis, Nam-Ho You, and Christopher K. Ober,
?œSynthesis and characterization of self-assembling block copolymers
containing fluorine groups?? Proc. SPIE 8323, 83230E (2012)
Chavis, Michelle A.; You, Nam-Ho; Maeda, Rina; Welch, Mary E.; Ohm,
Christian; Ober, Christopher K., ?œCleavable self-organized thin films:
block copolymers and brushes?? Polymer Preprints (American
Chemical Society, Division of Polymer Chemistry) 2012, 53(1), 283
Ober,
Christopher K., ?œThe challenge of nanotechnology: making patterns on
the size scale of macromolecules?? PMSE Preprints (2012), No pp. given.
Welch, Mary E.;
Ohm, Christian; Xu, Youyong; Deffner, Bernd; Hessberger, Tristan;
Lauck, Maximilian; Ober, Christopher K., ?œSelected methods of
patterning polymer brushes?? PMSE Preprints (2012), No pp. given.
Newby, Carol;
Lee, Jin-Kyun; Taylor, Priscilla G.; Zahkidov, Alexander A.; Fong, Hon
Hang; Midthun, Karl M.; Charzichristidi, Margarita; Malliaras, George
G.; Baird, Barbara A.; Ober, Christopher K., ?œOrthogonal solution??
PMSE Preprints (2012), No pp. given.
*
Rina Maeda, Teruaki Hayakawa, Christopher K. Ober, ?œDual Mode
Patternning of Fluorine-containing Block Copolymers through Combined
Top-down and Bottom-up Lithography?? Chem. Mater., (2012), 24(8), 1454.
*
Michael C. Gwinner, Thomas J. K. Brenner, Jin-Kyun Lee, Carol Newby,
Christopher K. Ober, Christopher R. McNeill and Henning Sirringhaus,
?œOrganic field-effect transistors and solar cells using novel high
electron-affinity conjugated copolymers based on alkylbenzotriazole and
benzothiadiazole?? J. Mater. Chem., (2012), 22(10), 4436.
*
Christine Y. Ouyang, Jin-Kyun Lee, Marie E. Krysak, Jing Sha and
Christopher K. Ober, ?œEnvironmentally Friendly Patterning of Thin Films
in Linear Methyl Siloxanes?? J. Mat. Chem., 2012, 22(12), 5746-5750.
*
Michael D. Dimitriou, Harihara S. Sundaram, Youngjin Cho, Marvin Y.
Paik, Masakazu Kondo, Kristin Schmidt, Daniel A. Fischer, Christopher
K. Ober, and Edward J. Kramer, ?œAmphiphilic Block Copolymer Surface
Composition: Effects of Spin Coating versus Spray Coating?? Polymer,
53(6), 1321-1327 (2012).
*
Zhaoli Zhou, Panpan Yu, Herbert M. Geller, Christopher K. Ober, ?œThe
role of hydrogels with tethered acetylcholine functionality on the
adhesion and viability of hippocampal neurons and glial cells??
Biomaterials, 2012, 33(8), 2473-2481.
*
Florian Wieberger, Drew C. Forman, Christian Neuber, André H. Gröschel,
Marietta Böhm, Axel H. E. Müller, Hans-Werner Schmidt and Christopher
K. Ober, ?œTailored Star-Shaped Statistical Teroligomers via ATRP for
Lithographic Applications?? J. Mat. Chem., 22(1), 73-79, 2012.
2011
*
Wolfgang-Andreas C. Bauer, Christian Neuber, Christopher K. Ober, and
Hans-Werner Schmidt, ?œCombinatorial Optimization of a Molecular Glass
Photoresist System for Electron Beam Lithography?? Adv. Mater., 2011,
23(45), 5405-5408.
*
S. Y. Yang, B. N. Kim, A. A. Zakhidov, P. G. Taylor, J.-K. Lee, C. K.
Ober, M. Lindau, G. G. Malliaras, ?œDetection of Transmitter Release
from Single Living Cells Using Conducting Polymer Microelectrodes??
Adv. Mat., 23(24), H184-H188 (2011)
*
Zakhidov, A. A.; Fong, H. H.; DeFranco, J. A.; Lee, J.-K.; Taylor, P.
G.; Ober, C. K.; Malliaras, G. G.; He, M.; Kane, M. G., ?œFabrication of
polymer-based electronic circuits using photolithography?? Applied
Physics Letters (2011), 99(18), 183308/1-183308/3.
*
Martinelli, Elisa; Galli, Giancarlo; Krishnan, Sitaraman; Paik, Marvin
Y.; Ober, Christopher K.; Fischer, Daniel A., ?œNew
poly(dimethylsiloxane)/poly(perfluorooctylethyl acrylate) block
copolymers: structure and order across multiple length scales in thin
films?? Journal of Materials Chemistry, 21(39), 15357-15368
(2011).
Chen, Lin;
Therien-Aubin, Heloise; Wong, Mavis; Hoek, Eric M. V.; Ober,
Christopher K., "Modification of reverse osmosis membranes with
antifouling polymer brushes using the layer by layer method", Polymer
Preprints (American Chemical Society, Division of Polymer Chemistry)
(2011), 52(2), 1070-1071.
Therien-Aubin, Heloise; Chen, Lin; Ober, Christopher K., "Fouling
resistant coatings for reverse osmosis membranes by Click grafting of
polymers", Polymer Preprints (American Chemical Society, Division of
Polymer Chemistry) (2011), 52(2), 1067-1068.
Lee, Jin-Kyun; Gwinner, Michael C.; Friend, Richard H.; Sirringhaus,
Henning; Ober, Christopher K.," Novel Synthesis of High-performance
Electron-transporting Polymers Employing a Heteroaryl
Bis(trifluoroborate)", Polymer Preprints (American Chemical Society,
Division of Polymer Chemistry) (2011), 52(2), 978-979.
Sundaram, Harihara S.; Cho, Youngjin; Zhou, Zhaoli; Yoo, Hee-Soo;
Dimitriou, Michael D.; Finlay, John A.; Callow, Maureen E.; Callow,
James A.; Kramer, Edward J.; Ober, Christopher K.. "Effect of
amphiphilic structures on antifouling and fouling release properties of
PS-B-P(E/B)-B-PI based triblock copolymer", Polymer Preprints (American
Chemical Society, Division of Polymer Chemistry) (2011), 52(2),
1034-1035.
Welch, Mary E.; Xu, Youyong; Ober, Christopher K., "Patterning of
polymer brushes", PMSE Preprints (2011), No pp. given.
*
DeFranco, John; Zakhidov, Alex; Lee, Jin-Kyun; Taylor, Priscilla; Fong,
Hon Hang; Chatzichristidi, Margarita; Hwang, Ha Soo; Ober, Christopher;
Malliaras, George, "Photolithographic patterning of organic electronic
materials", Edited by Samori, Paolo; Cacialli, Franco in Functional
Supramolecular Architectures (2011), 1, 399-419.
*
Dimitriou, Michael D.; Zhou, Zhaoli K.; Yoo, Hee-Soo; Killops, Kato L.;
Finlay, John A.; Cone, Gemma; Sundaram, Harihara S.; Lynd, Nathaniel
A.; Barteau, Katherine P.; Campos, Luis M.; et al., ?œA general approach
to controlling the surface composition of poly(ethylene oxide)-based
block copolymers for antifouling coatings?? Langmuir (2011), 27(22),
13762.
*
Prabhu, Vivek M.; Kang, Shuhui; Kline, R. Joseph; DeLongchamp, Dean M.;
Fischer, Daniel A.; Wu, Wen-li; Satija, Sushil K.; Bonnesen, Peter V.;
Sha, Jing; Ober, Christopher K. ?œCharacterization of the Non-uniform
Reaction in Chemically Amplified Calix[4]resorcinarene Molecular Resist
Thin Films?? Australian Journal of Chemistry (2011), 64(8), 1065-1073
*
Harihara S. Sundaram, Youngjin Cho, Michael D. Dimitriou, Craig J.
Weinman, John A. Finlay, Gemma Clay, Maureen E. Callow, James A.
Callow, Edward J. Kramer, Christopher K. Ober, ?œFluorine-Free Mixed
Amphiphilic Polymers Based on PDMS and PEG Side Chains for Fouling
Release Applications?? Biofouling, 27(7), 6, 589-601 (2011).
*
Chavis, Michelle A.; Schwartz, Evan L.; Ober, Christopher K., ?œBlock
copolymer nanostructured thin films for advanced patterning??
Hadjichristidis, Nikos; Hirao, Akira; Tezuka, Yasuyuki; Du Pres, Filip
ed., Complex Macromolecular Architectures: Synthesis, Characterization,
and Self-Assembly, Wiley (2011), 763-790.
*
Thérien-Aubin, Héloise; Chen, Lin; Ober, Christopher K.,
"Fouling-Resistant Polymer Brush Coatings", Polymer, 2011, 52(24),
5419-5425.
*
Xu, You-Yong; Hoshi, Yosuke; Ober, Christopher K., ?œPhoto-switchable
polyelectrolyte brush for dual protein patterning?? Journal of
Materials Chemistry (2011), 21(36), 13789-13792.
*
Jung, Byungki; Chandhok, Manish; Younkin, Todd R.; Ober, Christopher
K.; Thompson, Michael O., ?œTime dependent behavior of chemically
amplified resist characterized under sub-millisecond post exposure
bake?? Journal of Photopolymer Science and Technology (2011), 24(5),
487-490.
*
Ouyang, Christine Y.; Lee, Jin-Kyun; Ober, Christopher K., ?œStudies of
environmentally friendly solvent-based developers?? Journal of
Photopolymer Science and Technology (2011), 24(2), 239-240.
*
Harihara S. Sundaram, Youngjin Cho, Michael D. Dimitriou, John A.
Finlay, Gemma Cone, Sam Williams, Dale Handlin, Joseph Gatto, Maureen
E. Callow, James A. Callow, Edward J. Kramer, Christopher K. Ober,
"Fluorinated Amphiphilic Polymers and Their Blends for Fouling-Release
Applications: The Benefits of a Triblock Copolymer Surface", App. Mat
& Int., (2011), 3(9), 3366-3374.
*
Nikolaos Politakos, Craig J. Weinman, Marvin Y. Paik, Harihara S.
Sundaram, Christopher K. Ober and Apostolos Avgeropoulos, ?œSynthesis,
molecular, and morphological characterization of initial and modified
diblock copolymers with organic acid chloride derivatives?? J. Polym.
Sci.: Chem., Article first published online: 22 JUL 2011 | DOI:
10.1002/pola.24873
*
Jin-Kyun Lee, Michael C. Gwinner, Reinhard Berger, Carol Newby, Rudolf
Zentel, Richard H. Friend, Henning Sirringhaus, Christopher K. Ober,
"High-Performance Electron-Transporting Polymers Derived from a
Heteroaryl Bis(trifluoroborate)", JACS, 133(26), 9949-9951 (2011).
*
Youngjin Cho, Harihara S. Sundaram, Craig J. Weinman, Marvin Y. Paik,
Michael D. Dimitriou, John A. Finlay, Maureen E. Callow, James A.
Callow, Edward J. Kramer, Christopher K. Ober, "Triblock Copolymers
with Grafted Fluorine-Free, Amphiphilic, Non-Ionic Side Chains for
Antifouling and Fouling-Release Applications", Macromolecules, 44(12),
4783-4792 (2011)
*
Cho, Daehwan; Bae, Woo Jin; Joo, Yong; Ober, Christopher; Frey,
Margaret, "Properties of PVA/HfO2 Hybrid Electrospun Fibers and
Calcined Inorganic HfO2 Fibers", Journal of Physical Chemistry,
115(13), 5535-5544 (2011).
*
Ethan N. Chiang, Rong Dong, Christopher K. Ober, Barbara A. Baird,
?œCellular Responses to Patterned (Poly)Acrylic Acid Brushes?? Langmuir,
2011, 27(11), 7016-7023.
*
A. A. Zakhidov, J.-K. Lee, J. A. DeFranco, H. H. Fong, P. G. Taylor, M.
Chatzichristidi, C. K. Ober and G. G. Malliaras, ?œOrthogonal
Processing: A New Strategy for Organic Electronics?? Chemical Science,
2011, 2 (6), 1178 - 1182.
Ouyang,
Christine Y.; Lee, Jin-Kyun; Krysak, Marie; Ober, Christopher K.,
"Patterning conventional photoresists in environmentally friendly
silicone fluids", Proceedings of SPIE (2011), 7972(Pt. 1, Advances in
Resist Materials and Processing Technology XXVIII), 79720O/1-79720O/6.
Cho, Youngjin;
Ouyang, Christine Y.; Krysak, Marie; Sun, Wenjie; Gamez, Victor;
Sierra-Alvarez, Reyes; Ober, Christopher K., "Environmentally friendly
natural materials-based photoacid generators for next-generation
photolithography", Proceedings of SPIE (2011), 7972(Pt. 2,
Advances in Resist Materials and Processing Technology XXVIII),
79722A/1-79722A/11.
Krysak, Marie;
Trikeriotis, Markos; Schwartz, Evan; Lafferty, Neal; Xie, Peng; Smith,
Bruce; Zimmerman, Paul; Montgomery, Warren; Giannelis, Emmanuel; Ober,
Christopher K., "Development of an inorganic nanoparticle photoresist
for EUV, e-beam, and 193 nm lithography", Proceedings of SPIE (2011),
7972(Pt. 1, Advances in Resist Materials and Processing Technology
XXVIII), 79721C/1-79721C/6.
Ober,
Christopher K.; Ouyang, Christine; Lee, Jin-Kyun; Krysak, Marie,
"Solvent development processing of chemically amplified resists:
chemistry, physics, and polymer science considerations", Proceedings of
SPIE (2011), 7972(Pt. 1, Advances in Resist Materials and Processing
Technology XXVIII), 797205/1-797205/8.
Jung, Byungki;
Ober, Christopher K.; Thompson, Michael O.; Chandhok, Manish, "LWR
reduction and flow of chemically amplified resist patterns during
sub-millisecond heating", Proceedings of SPIE (2011), 7972(Pt. 2,
Advances in Resist Materials and Processing Technology XXVIII),
79722S/1-79722S/8.
Jung, Byung-Ki;
Ober, Christopher K.; Thompson, Michael O.; Younkin, Todd R.; Chandhok,
Manis, "Addressing challenges in lithography using sub-millisecond post
exposure bake of chemically amplified resists", Proceedings of SPIE
(2011), 7972(Pt. 1, Advances in Resist Materials and Processing
Technology XXVIII), 797219/1-797219/6.
*
Koerner, Hilmar; Ober, Christopher K.; Xu, Huan ?œProbing electric
field response of LC thermosets via time-resolved X-ray and dielectric
spectroscopy?? Polymer (2011), 52(10), 2206-2213.
*
Daga, Vikram K.; Schwartz, Evan L.; Chandler, Curran M.; Lee, Jin-Kyun;
Lin, Ying; Ober, Christopher K.; Watkins, James J. ?œPhotoinduced
Ordering of Block Copolymers?? Nano Letters (2011), 11(3),
1153-1160.
Sundaram,
Harihara S.; Cho, Youngjin; Weinman, Craig J.; Paik, Marvin Y.;
Dimitriou, Mike D.; Brewer, Lenora H.; Finlay, John; Wendt, Dean E.;
Callow, Maureen E.; Callow, James A.; Kramer, Edward J.; Ober,
Christopher K. ?œEnvironmentally friendly mixed amphiphilic
surface active block copolymers for foul release applications?? PMSE
Preprints (2011), No pp. given
Hoshi, Yosuke;
Xu, Youyong; Ober, Christopher K. ?œPhoto-responsive polymer brush
for protein patterning?? PMSE Preprints (2011), No pp.
given.
Ober, Christopher K. ?œPatterning thin films: Do we need polymers any more??? PMSE Preprints (2011), No pp. given.
Therien-Aubin,
Heloise; Chen, Lin; Ober, Christopher K. ?œAntifouling properties
of functionalized polyaramide membranes?? Polymer
Preprints (American Chemical Society, Division of Polymer
Chemistry) (2011), 52(1), No pp. given.
Ouyang,
Christine Y.; Lee, Jin-Kyun; Krysak, Marie E.; Ober, Christopher
K. ?œEnvironmentally friendly development of conventional
polymeric photoresists using non-polar silicone fluids?? Polymer
Preprints (American Chemical Society, Division of Polymer Chemistry)
(2011), 52(1), No pp. given.
* Christopher K. Ober, ?œTribute: Robert W. Lenz?? Macromolecules, 2011, ASAP.
*
Hon Hang Fong, Jin-Kyun Lee, Yee-Fun Lim, Alexander A. Zakhidov,
Wallace W. H. Wong, Andrew B. Holmes, Christopher K. Ober, George G.
Malliaras, ?œOrthogonal Processing and Patterning Enabled by Highly
Fluorinated Light-Emitting Polymers?? Advanced Materials, 23(6),
735??39, 2011.
*
A. De Silva and C. K. Ober, ?œPatterning by Lithography?? in Functional
Polymeric Ultrathin Films, R. Advincula and W. Knoll, eds., Wiley-VCH
(Weinheim), 2011, 1, 475-499.
*
Mary Welch, Abhinav Rastogi, Christopher Ober, "Utilizing Polymer
Brushes for the Development of Electrochemical Biosensors", Soft
Matter, (2011), 7(2), 297-302.
2010
*
Kim Y, Malliaras GG, Ober CK, Kim E, "An Electrochemical Glucose Sensor
from an Organically Modified Nanocomposite of Viologen and TiO2",
Journal of Nanoscience and Nanotechnology, 10(10), 6869-6873 (2010).
*
Marvin Y. Paik, Youyong Xu, Abhinav Rastogi, Manabu Tanaka, Yi Yi and
Christopher K. Ober, ?œPatterning of Polymer Brushes ??A Direct Approach
to Complex, Sub-Surface Structure?? Nano Letters, 10(10), 3873-3879
(2010).
Sundaram,
Harihara S.; Cho, Youngjin; Weinman, Craig J.; Paik, Marvin Y.;
Dimitriou, Mike; Finlay, John; Callow, Maureen E.; Callow, James A.;
Kramer, Edward J.; Ober, Christopher K. Environmentally
friendly non-ionic and fluorine free surface-active amphiphilic block
copolymers for fouling release applications. PMSE Preprints (2010), No
pp. given.
Krysak, Marie;
Ober, Christopher K. Photoacid generator-attached molecular
glass photoresists. PMSE Preprints (2010), No pp. given.
Ober,
Christopher K.; Ouyang, Christine Y.; Lee, Jin-Kyun; Sha, Jing. Green
processing of photoresists in non-polar fluids for high-resolution
patterning. PMSE Preprints (2010), No pp. given.
Chavis, Michelle
A.; Bosworth, Joan K.; Andre, Xavier; Paik, Marvin; Schwartz, Evan L.;
Ober, Christopher K. Top-down meets bottom-up: self-assembly of
patternable block copolymers. PMSE Preprints (2010), No pp. given.
Xu, Youyong;
Paik, Marvin Y.; Welch, Mary E.; Ober, Christopher K. Direct
patterning of multi-component polymer brushes. PMSE Preprints
(2010), No pp. given.
*
Rong Dong, Raymond P. Molloy, Manfred Lindau, Christopher K. Ober,
"Quaternized PMETA Polymer Brushes and Their Applications for Guiding
Neuronal Growth", Biomacromolecules, (2010), 11(8), 2027-203.
*
Schwartz, Evan L.; Ober, Christopher K., ?œPhase-selective chemistry in
block copolymer systems?? Editor(s): Geckeler, Kurt E.; Nishide,
Hiroyuki. Advanced Nanomaterials (2010), 1 1-66. Publisher: Wiley-VCH
Verlag GmbH & Co. KGaA, Weinheim, Germany
*
Cornelius B. Kristalyn, Xiaolin Lu, Craig J. Weinman, Christopher K.
Ober, Edward J. Kramer, Zhan Chen, "Surface Structures of an
Amphiphilic Tri-Block Copolymer in Air and in Water Probed Using Sum
Frequency Generation Vibrational Spectroscopy", Langmuir, (2010),
26(13), 11337-11343.
*
Woo Jin Bae, Markos Trikeriotis, Jing Sha, Evan L. Schwartz, Robert
Rodriguez, Paul Zimmerman, Emmanuel P. Giannelis and Christopher K.
Ober, "High Refractive Index and High Transparency HfO2 Nanocomposites
for Next Generation Lithography", J. Mat. Chem., (2010), 20(25),
5186-5189.
*
Daewon Park, Craig J. Weinman, John A. Finlay, Benjamin R. Fletcher,
Marvin Y. Paik, Harihara S. Sundaram, Michael Dimitriou, Karen E. Sohn,
Maureen E. Callow, James A. Callow, Dale L. Handlin, Carl L. Willis,
Daniel A. Fischer, Edward J. Kramer, and Christopher K. Ober,
"Amphiphilic Surface Active Triblock Copolymers with Mixed Hydrophobic
and Hydrophilic Side Chains for Tuned Marine Fouling-Release
Properties", Langmuir, (2010), 26(12), 9772-9781.
*
Jing Sha, Jin-Kyun Lee, Christopher K. Ober, Shuhui Kang, Vivek M.
Prabhu, Christopher L. Soles, Peter V. Bonnesen, ?œArchitectural Effects
on Reaction-Diffusion Kinetics in Molecular Glass Photoresists?? Chem.
Mater., (2010), 22(10), 3093-3098.
*
Craig J. Weinman, Nikhil Gunari, Sitaraman Krishnan, Rong Dong, Marvin
Y. Paik, Karen E. Sohn, Gilbert C. Walker, Edward J. Kramer, Daniel A.
Fischer, Christopher K. Ober, ?œProtein Adsorption Resistance of
Anti-Biofouling Block Copolymers Containing Amphiphilic Side Chains??
Soft Matter, 6(14), 3237-3243 (2010).
Jung, Byungki; Sha, Jing; Paredes, Florencia; Ober, Christopher K.;
Thompson, Michael O.; Chandhok, Manish; Younkin, Todd R.
Sub-millisecond post exposure bake of chemically amplified resists by
CO2 laser heat treatment. Proceedings of SPIE (2010), 7639
76390L-76390L-9.
Taylor,
Priscilla G.; Lee, Jin-Kyun; Zakhidov, Alexander A.; Hwang, Ha Soo;
DeFranco, John A.; Fong, Hon Hang; Chatzichristidi, Margarita;
Murotani, Eisuke; Malliaras, George G.; Ober, Christopher K. Orthogonal
lithography for organic electronics. Proceedings of SPIE (2010),
7639 76390Z-76390Z-8.
Schwartz, Evan
L.; Bosworth, Joan K.; Paik, Marvin Y.; Ober, Christopher K. New
self-assembly strategies for next generation
lithography. Proceedings of SPIE (2010),
7639 76390G-76390G-11.
Krysak, Marie;
Kolb, Tristan; Neuber, Christian; Schmidt, Hans-Werner; Ober,
Christopher K. All-dry processible and PAG-attached molecular glasses
for improved lithographic performance. Proceedings of
SPIE (2010), 7639 76392C-76392C-8.
Forman, Drew C.;
Wieberger, Florian; Groeschel, Andre; Mueller, Axel H. E.; Schmidt,
Hans-Werner; Ober, Christopher K. Comparison of star and linear ArF
resists. Proceedings of SPIE (2010),
7639 76390P-76390P-8.
Ouyang,
Christine Y.; Lee, Jin-Kyun; Sha, Jing; Ober, Christopher K.
Environmentally friendly processing of photoresists in scCO2 and
decamethyltetrasiloxane. Proceedings of SPIE
(2010), 7639 763912-763912-8.
Trikeriotis,
Markos; Bae, Woo Jin; Schwartz, Evan; Krysak, Marie; Lafferty, Neal;
Xie, Peng; Smith, Bruce; Zimmerman, Paul A.; Ober, Christopher K.;
Giannelis, Emmanuel P.; Development of an inorganic photoresist for
DUV, EUV, and electron beam imaging. Proceedings of
SPIE (2010), 7639 76390E-76390E-10.
*
Krishnan, Sitaraman; Paik, Marvin Y.; Ober, Christopher K.; Martinelli,
Elisa; Galli, Giancarlo; Sohn, Karen E.; Kramer, Edward J.; Fischer,
Daniel A. NEXAFS Depth Profiling of Surface Segregation in
Block Copolymer Thin Films. Macromolecules (2010), 43(10), 4733-4743.
*
Daewon Park, John A. Finlay, Rebekah J. Ward, Craig J. Weinman,
Sitaraman Krishnan, Marvin Paik, Karen E. Sohn, Maureen E. Callow,
James A. Callow, Esther R. Angert, Edward J. Kramer and Christopher K.
Ober, ?œAntimicrobial Behavior of Semifluorinated-Quaternized Triblock
Copolymers against Airborne and Marine Microorganisms?? Applied
Materials and Interfaces, (2010), 2(3), 703-711.
*
Marvin Y. Paik, Joan K. Bosworth, Detlef-M. Smilgies, Evan L. Schwartz,
Xavier André, Christopher K. Ober, ?œReversible Morphology Control in
Block Copolymer Films via Solvent Vapor Processing: An In-Situ GISAXS
Study?? Macromolecules, (2010), 43(9), 4253-4260.
*
Kang, Shuhui; Wu, Wenli; Choi, Kwang-Woo; De Silva, Anuja; Ober,
Christopher; Prabhu, Vivek, ?œCharacterization of the photoacid
diffusion length and reaction kinetics in EUV photoresists with IR
spectroscopy?? Macromolecules, (2010), 43(9), 4275-4286.
*
Kim, Yuna; Do, Jaekwon; Kim, Jeonghun; Yang, Sang Yoon; Malliaras,
George G.; Ober, Christopher K.; Kim, Eunkyoung. A glucose
sensor based on an organic electrochemical transistor structure using a
vapor polymerized poly(3,4-ethylenedioxythiophene) layer. Japanese
Journal of Applied Physics (2010), 49(1, Pt. 2),
01AE10/1-01AE10/6.
Paik, Marvin Y.;
Rastogi, Abhinav; Tanaka, Manabu; Xu, Youyong; Welch, Mary E.; Yi, Yi;
Ober, Christopher K. 2D and 3D patterning of polymer brushes using a
direct patterning approach. PMSE Preprints (2010), No pp.
given.
Welch, Mary E.;
Xu, Youyong; Rastogi, Abhinav; Smith, Norah; Tague, Michele; Chen,
Hongjun; Baird, Barbara A.; Abruna, Hector D.; Ober, Christopher
K. Functionalized polymer brushes for detection of antibodies in
an electrochemical biosensor. PMSE Preprints
(2010), No pp. given.
Therien-Aubin,
Heloise; Ober, Christopher K.; Huang, Xiaofei; Hoek, Eric
M. Antifouling polymer coating for reverse osmosis
membrane. Abstracts of Papers, 239th ACS National
Meeting, San Francisco, CA, United States, March 21-25, 2010
(2010), POLY-274.
*
Abhinav Rastogi, Marvin Y. Paik, Manabu Tanaka and Christopher K. Ober,
"Direct Patterning of Intrinsically E-beam Sensitive Polymer Brushes",
ACS Nano, (2010), 4(2), 771-780.
*
Jin-Kyun Lee, Hon Hang Fong, Alexander A. Zakhidov, Georgia E.
McCluskey, Priscilla G. Taylor, Mitk'el Santiago-Berrios, Héctor D.
Abruña, Andrew B. Holmes, George G. Malliaras, Christopher K. Ober*,
?œSemi-Perfluoroalkyl Polyfluorenes for Orthogonal Processing in
Fluorous Solvents?? Macromolecules, (2010), 43(3), 1195-1198.
*
Martien A. Cohen Stuart, Wilhelm T. S. Huck, Jan Genzer, Marcus Müller,
Christopher Ober, Manfred Stamm, Gleb B. Sukhorukov, Igal Szleifer,
Vladimir V. Tsukruk, Marek Urban, Françoise Winnik, Stefan Zauscher,
Igor Luzinov & Sergiy Minko, ?œEmerging applications of
stimuli-responsive polymer materials?? Nature Materials 9, 101 - 113
(2010)
*
Byung-Ryool Hyun, A. C. Bartnik, Jin-Kyun Lee, Hiroaki Imoto, Liangfeng
Sun, Joshua J. Choi, Yoshiki Chujo, Tobias Hanrath, Christopher K.
Ober, and F. W. Wise, ?œRole of Solvent Dielectric Properties on
Charge Transfer from PbS Nanocrystals to Molecules?? Nano Letters,
(2010), 10(1), 318-323.
2009
* Day, Peter; Interrante, Leonard V.; West, Anthony
R.; Shirota, Y.; Prato, Maurice; Tatsumi, K.; Loss, R. D.; Coplen, T.
B.; Ding, T.; Garcia-Martinez, J.; Leskela, M.; Oro, L. A.; Reedijk,
J.; Suh, M. P.; Chadwick, A. V.; Drabik, M.; Holden, N. E.; Mathur, S.;
Sakai, K.; Takats, J.; Basova, T. V.; Alles, A. Bologna; Gionfiantini,
R.; Karen, P.; Liu, L.-K.; Ohrstrom, L. R.; Corish, J.; Rosenblatt, G.;
Jones, R.; Ober, C.; Weir, R. D. Toward defining materials chemistry
(IUPAC technical report). Pure and Applied Chemistry (2009), 81(9),
1707-1717.
* Murotani E., Lee J.K., Chatzichristidi M., Zakhidov
A.A., Taylor P.G., Schwartz E.L., Malliaras G.G., Ober CK,
?œCross-Linkable Molecular Glasses: Low Dielectric Constant Materials
Patternable in Hydrofluoroethers?? ACS Applied Materials &
Interfaces, 1(10), 2363-2370 (2009).
* Sha, Jing; Jung, Byungki; Thompson, Michael O.;
Ober, Christopher K.; Chandhok, Manish; Younkin, Todd R.
?œSubmillisecond post-exposure bake of chemically amplified resists by
CO2 laser spike annealing?? J. Vac. Sci. Technol. B, 27(6), 3020-3024
(2009)
* Craig J. Weinman, John A. Finlay, Daewon Park,
Marvin Y. Paik, Sitaraman Krishnan, Harihara S. Sundaram, Michael
Dimitriou, Karen E. Sohn, Maureen E. Callow, James A. Callow, Dale L.
Handlin, Carl L. Willis, Edward J. Kramer and Christopher K. Ober, ?œABC
Triblock Surface Active Block Copolymers with Grafted Ethoxylated
Fluoroalkyl Amphiphilic Side Chains for Marine
Anti-Fouling/Fouling-Release Applications?? Langmuir, 25(20),
12266-12274 (2009).
* Joan K. Bosworth, Jing Sha, Charles T. Black,
Christopher K. Ober, ?œSelective Area Control of Self-Assembled Pattern
Architecture Using a Lithographically Patternable Block Copolymer?? ACS
Nano, 2009, 3(7), pp 1761??766.
* Abhinav Rastogi, Marvin Y. Paik and Christopher K.
Ober, "Dry Development of a Directly Patterned Low Surface Energy
Polymer Brush in Supercritical Carbon Dioxide", Applied Materials and
Interfaces, (2009), 1(9), 2013-2020.
* Abhinav Rastogi, Suddhasattwa Nad, Manabu Tanaka,
Nicolas Da Mota, Michele Tague, Barbara A. Baird, Héctor D. Abruña and
Christopher K. Ober, ?œPreventing Non-Specific Adsorption on Polymer
Brush Covered Gold Electrodes Using a Modified ATRP Initiator??
Biomacromolecules, (2009), 10(10), 2750-2758.
* Yi Yi, Ramakrishnan Ayothi, Yueh Wang, Mingqi
Li, George Barclay, Heidi Cao and Christopher K. Ober,
?œSulfonium Salts of Alicyclic Group Functionalized Semifluorinated
Alkyl Ether Sulfonates As Photoacid Generators?? Chem. Mater.,
(2009), 21(17), 4037-4046.
Wallace, W. E.; Flynn, K. M.; Guttman, C. M.; Vander Hart, D. L.;
Prabhu, V. M.; De Silva, A.; Felix, N. M.; Ober, C. K.
Quantitative measurement of the molecular-mass distribution in
calix[4]resorcinarene molecular glass resists by mass
spectrometry. Proceedings of SPIE (2009),
7273(Pt. 2, Advances in Resist Materials and Processing Technology
XXVI), 72732L/1-72732L/9.
Trikeriotis, Markos; Rodriguez, Robert; Zettel, Michael F.;
Bakandritsos, Aristeidis; Bae, Woo Jin; Zimmerman, Paul A.; Ober,
Christopher K.; Giannelis, Emmanuel P. High refractive
index nanoparticle fluids for 193-nm immersion
lithography. Proceedings of SPIE (2009),
7273(Pt. 1, Advances in Resist Materials and Processing Technology
XXVI), 72732A/1-72732A/6
Bae, Woo Jin; Trikeriotis, Makros; Rodriguez, Robert; Zettel, Michael
F.; Piscani, Emil; Ober, Christopher K.; Giannelis, Emmanuel P.;
Zimmerman, Paul. High-index nanocomposite photoresist for
193-nm lithography. Proceedings of SPIE
(2009), 7273(Pt. 1, Advances in Resist Materials and Processing
Technology XXVI), 727326/1-727326/10.
Sha, Jing; Lee, Jin-Kyun; Ober, Christopher K. Molecular
glass resists developable in supercritical carbon dioxide for 193 nm
lithography. Proceedings of SPIE (2009),
7273(Pt. 2, Advances in Resist Materials and Processing Technology
XXVI), 72732T/1-72732T/8.
Krysak, Marie; De Silva, Anuja; Sha, Jing; Lee, Jin-Kyun; Ober,
Christopher K. Molecular glass resists for next-generation
lithography. Proceedings of SPIE (2009),
7273(Pt. 2, Advances in Resist Materials and Processing Technology
XXVI), 72732N/1-72732N/8. CODEN: PSISDG
ISSN:0277-786X.
* Lee JK, Taylor PG, Zakhidov AA, et al., ?œOrthogonal
Processing: A Novel Photolithographic Patterning Method for Organic
Electronics, ?œJournal Of Photopolymer Science And Technology, 22(5),
565-569 (2009).
* Yee-Fun Lim, Jin-Kyun Lee, Alexander A. Zakhidov,
John A. DeFranco, Hon Hang Fong, Priscilla G. Taylor, Christopher K.
Ober and George G. Malliaras, ?œHigh voltage polymer solar cell
patterned with photolithography?? Journal Of Materials Chemistry,
19(30), 5394-5397 (2009).
* Tanaka, Manabu; Rastogi, Abhinav; Toepperwein,
Gregory N.; Riggleman, Robert A.; Felix, Nelson M.; de Pablo, Juan J.;
Ober, Christopher K. Fluorinated Quaternary Ammonium Salts as
Dissolution Aids for Polar Polymers in Environmentally Benign
Supercritical Carbon Dioxide, Chemistry of Materials, 21(14) 3125-3135
(2009)
* Manabu Tanaka, Abhinav Rastogi, Hiroto Kudo,
Daisuke Watanabe, Tadatomi Nishikubo, and Christopher K. Ober,
?œEnvironmentally Friendly Patterning of Molecular Waterwheel (Noria) in
Supercritical Carbon Dioxide?? J. Mater. Chem., 19(26), 4622-4626
(2009).
* Priscilla G. Taylor, Jin-Kyun Lee, Alexander A.
Zakhidov, Margarita Chatzichristidi, Hon Hang Fong, John A. DeFranco,
George G. Malliaras, Christopher K. Ober, ?œOrthogonal Patterning of
PEDOT:PSS for Organic Electronics using Hydrofluoroether Solvents??
Adv. Mater., (2009), 21(22), 2314-2317.
* Rong Dong, Manfred Lindau, Christopher K. Ober,
?œDissociation behavior of weak polyelectrolyte brushes on a planar
surface?? Langmuir, (2009) 25(8), 4774-4779.
* Vander Hart, David L.; Prabhu, Vivek M.; De Silva,
Anuja; Felix, Nelson M.; Ober, Christopher K. Solid state
NMR investigation of photoresist molecular glasses including blend
behavior with a photoacid generator. Journal of
Materials Chemistry (2009), 19(18), 2683-2694.
* Wallace, W. E.; Flynn, K. M.; Guttman, C. M.;
VanderHart, D. L.; Prabhu, V. M.; De Silva, A.; Felix, N. M.; Ober, C.
K. Quantitative measurement of the polydispersity in the
extent of functionalization of glass-forming
calix[4]resorcinarenes. Rapid Communications in Mass
Spectrometry (2009), 23(13), 1957-1962.
* Jin-Kyun Lee, Margarita Chatzichristidi, Alexander
A. Zakhidov, Ha Soo Hwang, Evan L. Schwartz, Jing Sha, Priscilla G.
Taylor, Hon Hang Fong, John A. DeFranco, Eisuke Murotani, Wallace W. H.
Wong, George G. Malliaras and Christopher K. Ober, ?œAcid-diffusion
behaviour in organic thin films and its effect on patterning?? J.
Mater. Chem., 2009, 19, 2986 - 2992, DOI: 10.1039/b817286b
* Shalin J. Jhaveri, Jesse D. McMullen, Rint
Sijbesma, and Warren Zipfel, ?œDirect three-dimensional microfabrication
of hydrogels via two-photon lithography in aqueous solution?? Chemistry
of Materials, (2009), 21(10), 2003-2006.
* Jing Sha and C. K. Ober, ?œFluorine- and
Siloxane-Containing Polymers for Supercritical Carbon Dioxide
Lithography?? Polymer International, (2009), 58(3), 302-306.
Ober, Christopher K.; Lee, Jin-Kyun; Zakhidov, Alexander A.; Fong, Hon
Hang; Taylor, Priscilla G.; DeFranco, John A.; Hwang, Ha Soo;
Chatzichristidi, Margarita; Holmes, Andrew B.; Malliaras, George
G. Orthogonal processing for organic
electronics. Polymer Preprints (American Chemical
Society, Division of Polymer Chemistry) (2009), 50(1),
Ober, Christopher K.; Rastogi, Abhinav; Dong, Rong; Tanaka, Manabu;
Chiang, Ethan N.; Berrios, Grace; Nad, Suddhasattwa; Smith, Norah;
Blum, Lisa; Bisharyan, Yelena; Liu, Yi; Berberian, Khajak; Clark,
Theodore; Appleton, Judith; Baird, Barbara A.; Lindau, Manfred; Abruna,
Hector D. Nanostructured polymer brushes for life science
applications. Polymer Preprints (American Chemical
Society, Division of Polymer Chemistry) (2009), 50(1),
Taylor, Priscilla G.; Lee, Jin Kyun; Zakhidov, Alexander A.;
Chatzichristidi, Margarita; Fong, Hon Hang; DeFranco, John; Malliaras,
George G.; Ober, Christopher K.. Synthesis and application
of a nonchemically amplified photoresist for organic
electronics. PMSE Preprints (2009),
100 521-522.
Lee, Jin-Kyun; Fong, Hon Hang; Zakhidov, Alexander A.; McCluskey,
Georgia E.; Taylor, Priscilla G.; Holmes, Andrew B.; Malliaras, George
G.; Ober, Christopher K.. Synthesis of semi-perfluoroalkyl
polyfluorenes for Orthogonal processing in hydrofluoroether
solvents. PMSE Preprints (2009),
100 504-505.
Murotani, Eisuke; Lee, Jin-Kyun; Chatzichristidi, Margarita; Zakhidov,
Alexander A.; Taylor, Priscilla G.; Ober, Christopher K.
Low-k materials patternable in environmentally friendly
solvents. PMSE Preprints (2009),
100 472-473.
* Ober, C. K.; Cheng, S. Z. D.; Hammond, P. T.;
Muthukumar, M.; Reichmanis, E.; Wooley, K. L.; Lodge, T. P.
Research in Macromolecular Science: Challenges and Opportunities for
the Next Decade. Macromolecules (2009),
42(2), 465-471.
* Georgia E. McCluskey, Jin-Kyun Lee, Jing Sha,
Christopher K. Ober and Andrew B. Holmes. ?œSynthesis and Processing of
Organic Materials in Supercritical Carbon Dioxide?? MRS Bulletin, Vol.
34, No. 2 (February 2009) pp. 73??44.
* Shalin J. Jhaveri, Matthew R. Hynd, James N.
Turner, William Shain, Christopher K. Ober, "2-Hydroxyethyl
methacrylate based hydrogel coated neural prosthetic devices for
delivery of nerve growth factor", Biomacromolecules, 2009, 10 (1),
174??83.
* E. Martinelli, S. Menghetti, G. Galli, A. Glisenti,
Sitaraman Krishnan, Marvin Y. Paik, Christopher K. Ober, Detlef-M.
Smilgies, Daniel A. Fischer, "Macromolecular Engineering Of
Styrene/Amphiphilic Styrene Block Copolymers", J. Polym. Sci.: Chem.
Ed., 47(1), 267-284 2009.
* Lorenz Steidl, Shalin J. Jhaveri, Ramakrishnan
Ayothi, Jing Sha, Jesse D. McMullen, Sin Yee Cindy Ng, Warren R.
Zipfel, Rudolf Zentel, and Christopher K. Ober, ?œNon-ionic photo-acid
generators for applications in two-photon lithography?? J. Mater.
Chem., 19(4), 505-513 (2009).
2008
* Nelson Felix and Christopher K. Ober, ?œAcid-Labile,
Chain-Scission Polymer Systems Used as Positive-Tone Photoresists
Developable in Supercritical CO2?? Chem. Mater., 2008, 20 (9), pp
2932??936.
* Sivaniah, Easan; Genzer, Jan; Hexemer, Alex;
Kramer, Edward; Xiang, Maoliang; Li, Xuefa; Ober, Christopher; Magonov,
Sergei ?œNon-planar surface organization of dendrons in side-chain
modified liquid crystalline block copolymers?? Macromolecules, (2008),
41(24), 9940-9945.
* Anuja De Silva, Linda K. Sundberg, Hiroshi Ito,
Ratnam Sooriyakumaran, Robert D. Allen and Christopher K. Ober, ?œA
Fundamental Study On Dissolution Behavior Of High Resolution Molecular
Glass Photoresists?? Chem. Mater., (2008), 20(23),
7292-7300.
* Anuja De Silva, Nelson M. Felix, and Christopher K.
Ober, ?œMolecular Glass Resists as High Resolution Patterning
Materials?? Adv. Mater., (2008), 20(17), 3355-3361
* A. A. Zakhidov, Jin-Kyun Lee, Hon Hang Fong, John
A. DeFranco, Margarita Chatzichristidi, Priscilla Taylor, Christopher
K. Ober and George G. Malliaras, ?œOrthogonal solvents for chemical
processing of organic electronic materials?? Adv. Mater., (Weinheim,
Germany) (2008), 20(18), 3481-3484.
* J. K. Bosworth, M. Y. Paik, R. Ruiz, E. L.
Schwartz, J. Q. Huang, A. W. Ko, D.-M. Smilgies, C. T. Black and C. K.
Ober, ?œControl of Self Assembly of Lithographically-Patternable Block
Copolymer Films?? ACS Nano, (2008), 2(7), 1396-1402.
* Jin-Kyun Lee, Margarita Chatzichristidi, Alexander
Zakhidov, Priscilla G. Taylor, John A. DeFranco, Ha Soo Hwang, Hon Hang
Fong, Andrew B. Holmes, George G. Malliaras, Christopher K. Ober,
?œAcid-sensitive Semi-perfluoroalkyl Resorcinarene: An Imaging Material
for Organic Electronics?? JACS, (2008), 130(35), 11564-11565.
Ober, Christopher K.; Dong, Rong; Rastogi, Abhinav; Weinman, Craig J.;
Tanaka, Manabu; Hemmelmann, Mirjam; Chiang, Ethan N.; Park, Daewon; Yi,
Yi; Paik, Marvin Y.; Nad, Suddhasattwa; Smith, Norah; Handlin, Dale L.;
Willis, Carl L.; Kramer, Edward J.; Baird, Barbara A.; Abruna, Hector
D. Polymer brushes as responsive materials for the
biology-material interface. PMSE Preprints (2008), 99
109-110.
Bosworth, Joan K.; Paik, Marvin Y.; Schwartz, Evan L.; Ruiz, Ricardo;
Black, Charles T.; Smilgies, Detlef-M.; Ober, Christopher K.
Morphology control of lithographically patternable diblock copolymer by
solvent annealing. PMSE Preprints (2008),
99 158-159.
Dong, Rong; Lindau, Manfred; Ober, Christopher K.
Investigating dissociation behavior of weak polyelectrolyte brushes on
a planar surface by FTIR and contact angle titration.
PMSE Preprints (2008), 99 404-405.
Paik, Marvin Y.; Rastogi, Abhinav; Tanaka, Manabu; Ober, Christopher
K. Direct patterning of polymer brushes using electron beam
lithography. PMSE Preprints (2008), 99
529-530.
Rastogi, Abhinav; Tanaka, Manabu; Nad, Suddhasattwa; Smith, Norah;
Baird, Barbara A.; Abruna, Hector D.; Ober, Christopher K.
Role of polymer brushes in the development of an
electrochemical/gravimetric biosensor. PMSE
Preprints (2008), 99 541-542.
* Kudo, Hiroto; Watanabe, Daisuke; Nishikubo,
Tadatomi; Maruyama, Ken; Shimizu, Daisuke; Kai, Toshiyuki; Shimokawa,
Tsutomu; Ober, Christopher K. A novel noria
(water-wheel-like cyclic oligomer) derivative as a chemically amplified
electron-beam resist material. Journal of Materials
Chemistry (2008), 18(30), 3588-3592.
Manabu Tanaka, Abhinav Rastogi, Nelson M. Felix, Christopher K.
Ober, ?œSupercritical Carbon Dioxide Compatible Salts: Synthesis
and Application to Next Generation Lithography?? Journal of
Photopolymer Science & Technology, (2008), 21(3),
393-396
Zimmerman, Paul A.; Rice, Bryan; Rodriguez, Robert; Zettel, Michael F.;
Trikeriotis, Markos; Wang, Dongyan; Yi, Yi; Bae, Woo Jin; Ober,
Christopher K.; Giannelis, Emmanuel P. The use of
nanocomposite materials for high refractive index immersion
lithography. Journal of Photopolymer Science and Technology
(2008), 21(5), 621-629.
* Sitaraman Krishnan, Craig J. Weinman and
Christopher K. Ober, ?œAdvances in Polymers for Anti-Biofouling
Surfaces?? J. Mater. Chem., (2008), 18(29), 3405-3413.
* Ha Soo Hwang, Alexander A. Zakhidov, Jin-kyun Lee,
Xavier André, John A. DeFranco, Hon Hang Fong, Andrew B. Holmes, George
G. Malliaras, Christopher K. Ober, ?œDry Photolithographic Patterning
Process for Organic Electronic Devices using Supercritical Carbon
Dioxide as a Solvent?? J. Mater. Chem., 2008, 18, 3087 - 3090.
* Nelson M. Felix, Anuja De Silva, and Christopher K.
Ober, ?œCalix[4]resorcinarene Derivatives as High Resolution Photoresist
Materials for Supercritical CO2 Processing?? Adv. Mater., (2008),
20(7), 1303-1309.
* Ji-Hyun Jang, Shalin J. Jhaveri, Boris Rasin,
Choeng Yang Koh, Christopher K. Ober and Edwin L. Thomas,
?œThree-dimensionally Patterned Submicron Scale Hydrogel/Air Networks
that Offer a New Platform for Biomedical Applications?? Nano Letters,
(2008), 8(5), 1456-1460.
Weinman, Craig J.; Finlay, John A.; Park, Daewon;
Paik, Marvin Y.; Krishnan, Sitaraman; Fletcher, Benjamin R.; Callow,
Maureen E.; Callow, James A.; Handlin, Dale L.; Willis, Carl L.;
Fischer, Daniel A.; Sohn, Karen E.; Kramer, Edward J.; Ober,
Christopher K. Antifouling ABC triblock copolymers with
grafted functionality. PMSE Preprints (2008),
98 639-641.
Krishnan, Sitaraman; Finlay, John A.; Park, Daewon;
Weinman, Craig J.; Dong, Rong; Wong, Kaiming; Asgill, Nicola; Callow,
Maureen E.; Callow, James A.; Handlin, Dale L.; Willis, Carl L.;
Brewer, Lenora; Wendt, Dean E.; Sohn, Karen E.; Kramer, Edward J.;
Ober, Christopher K. Ambiguous polymeric surfaces for
marine antifouling applications. PMSE Preprints (2008),
98 83-84.
De Silva, Anuja; Felix, Nelson M.; Ober, Christopher K. New
architectures for high resolution resist materials: molecular glass
resists. PMSE Preprints (2008), 98 64-65.
Zimmerman, Paul A.; Byers, Jeffrey; Rice, Bryan; Ober, Christopher K.;
Giannelis, Emmannuel P.; Rodriguez, Robert; Wang, Dongyan; O?™Connor,
Naphtali; Lei, Xuegong; Turro, Nicholas J.; Liberman, Vladimir;
Palmacci, Stephen; Rothschild, Mordechai; Lafferty, Neal; Smith, Bruce
W. Development and evaluation of a 193nm immersion
generation-three fluid candidates. Proceedings of
SPIE (2008), 6923 69230A-69230A-10.
Zimmerman, Paul A.; Byers, Jeffrey; Piscani, Emil; Rice, Bryan; Ober,
Christopher K.; Giannelis, Emmannuel P.; Rodriguez, Robert; Wang,
Dongyan; Whittaker, Andrew; Blakey, Idriss; Chen, Lan; Dargaville,
Bronwin; Liu, Heping. Development of an operational high
refractive index resist for 193nm immersion
lithography. Proceedings of SPIE (2008),
6923 692306-692306-10.
Yi, Yi; Ayothi, Ramakrishnan; Ober, Christopher K.; Yueh, Wang; Cao,
Heidi. Ionic photoacid generators containing functionalized
semifluorinated sulfonates for high-resolution
lithography. Proceedings of SPIE (2008),
6923 69231B-69231B-8.
Kang, Shuhui; Lavery, Kristopher; Choi, Kwang-Woo; Prabhu, Vivek M.;
Wu, Wen-Li; Lin, Eric; De Silva, Anuja; Felix, Nelson; Ober,
Christopher. A comparison of the reaction-diffusion
kinetics between model-EUV polymer and molecular-glass
photoresists. Proceedings of SPIE (2008),
6923 692317-692317-12. CODEN: PSISDG ISSN:0277-786X.
VanderHart, David L.; De Silva, Anuja; Felix, Nelson M.; Prabhu, Vivek
M.; Ober, Christopher K.. The effect of EUV molecular glass
architecture on the bulk dispersion of a photo-acid
generator. Proceedings of SPIE (2008),
6923 69231M-69231M-15.
De Silva, Anuja; Felix, Nelson; Sha, Jing; Lee, Jin-Kyun; Ober,
Christopher K.. Molecular glass resists for next generation
lithography. Proceedings of SPIE (2008),
6923 69231L-69231L-14. CODEN: PSISDG ISSN:0277-786X.
Felix, Nelson M.; De Silva, Anuja; Sha, Jing; Ober, Christopher
K.. Achieving small dimensions with an environmentally
friendly solvent: photoresist development using supercritical
CO2. Proceedings of SPIE (2008), 6923
69233L-69233L-11.
* Anuja De Silva and Christopher K. Ober,
?œHydroxyphenylbenzene Derivatives as Glass Forming Molecules for High
Resolution Photoresists?? J. Mater. Chem., 2008, 18, 1903 - 1910.
* Anuja De Silva, Jin Kyun Lee, Xavier André, Nelson
M. Felix, Heidi B. Cao, Hai Deng and Christopher K. Ober, ?œStudy of the
Structure-Properties Relationship of Phenolic Molecular Glass Resists
for Next Generation Photolithography?? Chem. Mater., 20 (4), 1606??613,
2008.
* Nagarajan, Sivakumar; Bosworth, Joan; Ober,
Christopher; Russell, Thomas; Watkins, James, ?œSimple Fabrication of
Micropatterned Mesoporous Silica Films Using PAGs in Block Copolymers??
Chem. Mater., 20(3) 604-606, 2008.
* Sivakumar Nagarajan, Rajaram A. Pai, Thomas P.
Russell, James J. Watkins, Mingqi Li, Katy S. Bosworth, Detlef-M.
Smilgies, Christopher K. Ober, ?œAn Efficient Route to Mesoporous Silica
Films with Perpendicular Nanochannels?? Adv. Mater., 2008, 20(2),
246??51.
* John A Finlay, Sitaraman Krishnan, Maureen E
Callow, James A Callow, Rong Dong, Nicola Asgill, Kaiming Wong, Edward
J. Kramer, Christopher K. Ober, ?œSettlement of Ulva Zoospores on
Patterned Fluorinated and PEGylated Monolayer Surfaces?? Langmuir,
(2008), 24(2), 503-510.
* Frauke Pfeiffer, Nelson M. Felix, Christian Neuber,
Christopher K. Ober, and Hans-Werner Schmidt, ?œTowards Environmentally
Friendly, Dry Deposited, Water Developable Molecular Glass
Photoresists?? Physical Chemistry Chemical Physics, 10(9), 1257-1262:
2008.
Nagarajan, Sivakumar; Bosworth, Joan K.; Ober,
Christopher K.; Russell, Thomas P.; Watkins, James J.
Directly patterned mesoporous dielectric films templated from
chemically amplified block copolymers. Advanced
Metallization Conference 2007, Proceedings, October 9-11, 2007 in
Tokyo, Japan, and October 22-24, 2007 in New York, NY, United States,
2007 (2008), Meeting Date 2007, 495-499.
2007
* Nelson M. Felix, Anuja De Silva, Camille Man Yin
Luk and Christopher K. Ober, ?œDissolution Phenomena of Phenolic
Molecular Glass Photoresist Films in Supercritical CO2?? J. Mater.
Chem., (2007), 17(43), 4598-4604.
Joan K. Bosworth, Xavier Andre, Evan L. Schwartz, Ricardo Ruiz, Charles
T. Black and Christopher K. Ober, "Control of Morphology Orientation in
Lithographically Patternable Diblock Copolymers", Journal of
Photopolymer Science and Technology, (2007), 20(4), 519-522.
* Rong Dong, Sitaraman Krishnan, Barbara A. Baird,
Manfred Lindau, Christopher K. Ober*, ?œPatterned Biofunctional Polymer
Brushes?? Biomacromolecules, (2007), 8(10), 3082-3092.
Xavier André, Jin Kyun Lee, Anuja DeSilva, Christopher K. Ober, Heidi
B. Cao, Hai Deng, Hiroto Kudo, Daisuke Watanabe, Tadatomi Nishikubo,
"Phenolic Molecular Glasses as Resists for Next Generation
Lithography", Proceedings of SPIE-The International Society for
Optical Engineering (2007), 6519(Pt. 2, Advances in Resist
Materials and Processing Technology XXIV), 65194B/1-65194B/10.
* Frauke Pfeiffer, Nelson Felix, Christian Neuber,
Christopher K. Ober, Hans-Werner Schmidt, ?œPhysical Vapor Deposition of
Chemically Amplified Photoresists: A New Route to Patterning Molecular
Glass Resists?? Advanced Functional Materials (2007),
17(14), 2336-2342.
* Niamsiri, Nuttawee; Bergkvist, Magnus; Delamarre,
Soazig C.; Cady, Nathan C.; Coates, Geoffrey W.; Ober, Christopher K.;
Batt, Carl A. Insight in the role of bovine serum albumin for
promoting the in situ surface growth of polyhydroxybutyrate (PHB) on
patterned surfaces via enzymatic surface-initiated
polymerization. Colloids and Surfaces, B: Biointerfaces (2007),
60(1), 68-79.
* Daniel Bratton, Ramakrishnan Ayothi, Hai Deng,
Heidi B. Cao and Christopher K. Ober, ?œDiazonaphthoquinone Molecular
Glass Photoresists: Patterning without Chemical Amplification ?? Chem.
Mater., 19(15); 3780-3786 (2007).
* Birger Lange, Shalin J. Jhaveri, Lorenz Steidl, R.
Ayothi and Christopher K. Ober, Rudolf Zentel, "Creating defined 3D
defects inside an opaline Ormocer® matrix with two-photon lithography??
Macromol. Rapid Commun., 2007, 28, 922??26.
* Marvin Y. Paik, Sitaraman Krishnan, Fengxiang You,
Xuefa Li, Yushi Ando, Seok Ho Kang, Alexander Hexemer, Edward J.
Kramer, Daniel A. Fischer, Christopher K. Ober, ?œSurface organization,
light-driven surface changes and stability of semifluorinated
azobenzene polymers?? Langmuir, 2007, 23, 5110-5119.
* R. Ayothi, Y. Yi, H. Cao, Y. Wang, S. Putna, C. K.
Ober, ?œArylonium photoacid generators containing environmentally
compatible aryloxyperfluoroalkanesulfonate groups?? Chem. Mater.,
19(6): 1434-1444 (2007).
Bosworth, Joan K.; Schwartz, Evan L.; Huang, Jenny
Q.; Ko, Albert W.; Ruiz, Ricardo; Black, Charles T.; Ober, Christopher
K. Graphoepitaxy and orientational control of lithographically
patternable diblock copolymers by solvent annealing. PMSE
Preprints (2007), 96 659-660.
Weinman, Craig J.; Krishnan, Sitaraman; Park,
Daewon; Paik, Marvin Y.; Wong, Kaiming; Fischer, Daniel A.; Handlin,
Dale L.; Kowalke, Greg L.; Wendt, Dean E.; Sohn, Karen E.; Kramer,
Edward J.; Ober, Christopher K.. Antifouling block copolymer
surfaces that resist settlement of Barnacle Larvae.
PMSE Preprints (2007), 96 597-598.
* Peter Busch, Sitaraman Krishnan, Marvin Paik,
Gilman E.S. Toombes, Detlef-M. Smilgies, Sol M. Gruner and Christopher
K. Ober, ?œSurface induced tilt propagation in thin films of
semifluorinated liquid-crystalline side-chain block copolymers??
Macromolecules, 40(1): 81-89 (2007).
* Daniel Bratton, Ramakrishnan Ayothi, Nelson Felix
and Christopher K. Ober, ?œApplications of Controlled Macromolecular
Architectures to Lithography?? in Macromolecular Engineering: From
Precise Macromolecular Synthesis to Macroscopic Materials Properties
and Application, K. Matykaszewski, Y. Gnanou and L. Leibler, eds.,
Wiley-VCH, Weinheim, 2007.
2006
* Mingqi Li, Christopher K. Ober, ?œHigh Resolution
Patterning with Block Copolymers?? Materials Today, Volume 9, Issue 9,
September 2006, Pages 30-39.
* Sitaraman Krishnan, Rebekah J. Ward, Alexander
Hexemer, Kristen L. Lee, Esther R. Angert, Daniel A. Fischer, Edward J.
Kramer, Christopher K. Ober, ?œSurfaces of Fluorinated Pyridinium
Block-Copolymers with Enhanced Antibacterial Activity?? Langmuir, 22
(26): 11255-11266 (2006).
* Young-Je Kwark, J. Pablo Bravo, Manish Chandhok,
Heidi Cao, Hai Deng and Christopher K. Ober, ?œAbsorbance Measurement of
Polymers at EUV Wavelength: Correlation between experimental and
theoretical calculations?? JVSTB, B 24 (4): 1822-1826 JUL-AUG 2006.
* Fengxiang You, Marvin Y. Paik, Michael Häckel,
Lothar Kador, Daniela Kropp, Hans-Werner Schmidt, Christopher K. Ober,
?œSuppressing Surface Relief Gratings in Liquid Crystalline
Perfluoralkyl-azobenzene Polymers?? Adv. Func. Mater., 16 (12):
1577-1581 AUG 4 2006.
* Junyan Dai, Seung Wook Chang, Alyssandrea Hamad, Da
Yang, Nelson Felix, Christopher K. Ober, ?œMolecular Glass Resists For
High Resolution Patterning?? Chem. Mater., 18(15): 3404-3411 2006.
* Wageesha Senaratne, Kazutake Takada, Raibatak Das,
Jamie Cohen, Héctor D. Abruña, Barbara Baird and Christopher K. Ober,
?œDinitrophenyl Ligand Substrates and their Application to
Immunosensors?? Biosensors and Bioelectronics, 2006, Vol 22/1 pp 63-70.
Shalin J. Jhaveri, Wageesha Senaratne, Matthew R. Hynd, James N.Turner,
Barbara Baird, William Shain and Christopher K. Ober, ?œDefining the
Biology-Materials Interface using both 2D and 3D Lithography?? Journal
of Photopolymer Science & Technology, 19(4): 435-440 2006.
Ramakrishnan Ayothi, Seung Wook Chang, Nelson Felix, Heidi B. Cao, Hai
Deng, Wang Yueh, Christopher K. Ober, ?œNew PFOS Free Photoresist
Systems for EUV Lithography?? Journal of Photopolymer Science &
Technology, 19(4): 515-520 2006.
Lange, Birger; Zentel, Rudolf; Jhaveri, Shalin J.; Ober, Christopher
K. 3D defect engineering in polymer opals.
Proceedings of SPIE-The International Society for Optical
Engineering (2006), 6182(Photonic Crystal Materials and
Devices III), 61821W/1-61821W/11.
* J. Y. Mao, N. Felix, P. Nguyen, C. K. Ober and K.
K. Gleason, ?œPositive and Negative Tone Chemical Vapor Deposited
Polyacrylic E-beam Resists Developable by Supercritical CO2?? Advanced
Materials, Chem. Vap. Deposition 2006, 12, 259??62.
Ramakrishnan Ayothi, Yi Yi, Christopher K Ober, Steve Putna, Wang Yueh
and Heidi Cao, ?œAll-organic Non-PFOS Nonionic Photoacid Generating
Compounds with Functionalized Fluoroorganic Sulfonate Motif for
Chemically Amplified Resists?? Proceedings of SPIE-The International
Society for Optical Engineering (2006), 6153 -61530J.
Daniel Bratton, Ramakrishnan Ayothi, Nelson Felix, Heidi Cao, Hai Deng,
Christopher K. Ober, ?œMolecular Glass Resists for Next Generation
Lithography?? Proceedings of SPIE-The International Society for Optical
Engineering (2006), 6153 61531D.
Nelson Felix, Kousuke Tsuchiya, Camille Man Yin Luk and Christopher K.
Ober, ?œSupercritical CO2 for High Resolution Photoresist Development??
Proceedings of SPIE-The International Society for Optical Engineering
(2006), 6153 61534B.
Shinji Tanaka, Christopher K Ober, ?œAdamantane Based Molecular Glass
Resists for 193nm Lithography?? Proceedings of SPIE-The International
Society for Optical Engineering (2006), 6153 - 61532B.
Anuja De Silva, Drew Forman, Christopher K. Ober, ?œMolecular Glass
Resists for EUV Lithography?? Proceedings of SPIE-The International
Society for Optical Engineering (2006), 6153 615341.
* Sitaraman Krishnan, Ramakrishnan Ayothi, Alexander
Hexemer, John Finlay, Karen Sohn, Ruth Perry, Christopher K. Ober,
Edward J. Kramer, Maureen E. Callow, James A. Callow, Daniel Fischer,
?œAnti-Biofouling Properties of Comb-Like Block Copolymer with
Amphiphilic Side-Chains?? Langmuir, (2006), 22(11), 5075-5086.
Sitaraman Krishnan, Christopher K. Ober, Alexander
Hexemer, Edward. J. Kramer, and Daniel A. Fischer, ?œCompositional depth
profiling of block copolymer surfaces using NEXAFS?? PMSE Preprints,
(2006), 94 672-673.
Ramakrishnan Ayothi, Yi Yi, Nelson Felix,
Christopher K. Ober, Heidi Cao and Wang Yueh, ?œNon-PFOS photoacid
generating compounds for chemically amplified resists?? Polymer
Preprints, (2006), 47(1), 528-529.
Shalin J. Jhaveri, Christopher A. Coenjarts,
Loon-Seng Tan, Matthew R. Hynd, Ramamurthi Kannan, Richard A. Vaia,
James N. Turner, William Shain, and Christopher K. Ober. ?œTwo-photon
3-D patterning of gels and elastomers?? PMSE Preprints, (2006), 94,
44-45.
Lange, Birger; Zentel, Rudolf; Ober, Christopher K.
?œMethods for the preparation of defined embedded defects in polymer
opals.??Polymer Preprints (American Chemical Society, Division of
Polymer Chemistry) (2006), 47(1), 517-518.
* Sitaraman Krishnan, Nick Wang, Christopher K.
Ober,* John Finlay, Maureen E. Callow, James A. Callow, Alexander
Hexemer, Edward J. Kramer, Daniel A. Fischer, ?œComparison of the
Fouling Release Properties of Hydrophobic Fluorinated and Hydrophilic
PEGylated Block Copolymer Surfaces: Attachment Strength of the Diatom
Navicula and the Green Alga Ulva?? Biomacromolecules, (2006),
7(5), 1449-1462.
* Osuji, Chinedum O.; Chao, Chi-Yang; Ober,
Christopher K.; Thomas, Edwin L. ?œSupramolecular Microphase
Separation in a Hydrogen-Bonded Liquid Crystalline Comb Copolymer in
the Melt State?? Macromolecules, (2006), 39(9), 3114-3117.
* Wageesha Senaratne, Prabuddha Sengupta,
Vladimir Jakubek, David Holowka, Christopher K. Ober and Barbara
Baird, ?œSelf-assembled monolayer functionalized surface arrays for
investigating immune cell signaling?? JACS, (2006), 128(17),
5594-5595.
* Seung Wook Chang, Ramakrishnan Ayothi, Daniel
Bratton, Da Yang, Nelson Felix, Heidi B. Cao, Hai Deng and Christopher
K. Ober, ?œSub 50 nm Feature Sizes using Positive Tone Molecular Glass
Resists for EUV Lithography?? J. Mater. Chem., 2006, 16, 1470.
Ober, Christopher; Ueda, Mitsuru. Cornell
University, USA. Editorial. Polymers for Advanced Technologies (2006),
17(2), 71.
* Daniel Bratton, Da Yang, Junyan Dai and Christopher
K. Ober, ?œRecent progress in high resolution lithography?? Polymers for
Advanced Technology, 2006: 17: 94-103.
* Nelson M. Felix, Kosuke Tsuchiya, and Christopher
K. Ober, ?œHigh-Resolution Patterning Using Molecular Glasses and
Supercritical Carbon Dioxide?? Adv. Mater., (2006), 18(4),
442-446.
* Da Yang, Seung Wook Chang, Christopher K. Ober,
?œMolecular Glass Photoresists for Advanced Lithography?? J. Mater.
Chem., 2006, 16, 1693 - 1696.
* Kim, Young-Rok; Paik, Hyun-Jong; Ober, Christopher
K.; Coates, Geoffrey W.; Mark, Sonny S.; Ryan, Thomas E.; Batt, Carl
A. Real-time analysis of enzymatic surface-initiated
polymerization using surface plasmon resonance (SPR). Macromolecular
Bioscience (2006), 6(2), 145-152.
2005
* Da Yang, Shalin J. Jhaveri, and Christopher K.
Ober, ?œThree-Dimensional Microfabrication by Two-Photon Lithography??
MRS Bulletin, 30 (12), 976-982 (2005).
* Mingqi Li, Christopher Coenjarts and Christopher K.
Ober, ?œPatternable Block Copolymers?? in Block Copolymers II, Advances
in Polymer Science, V. Abetz, ed., 190 pp. 183 ??226, Springer
(Heidelberg) 2005.
Ober, Christopher K.; Senaratne, Wageesha; Sengupta, Prabuddha; Baird,
Barbara. Patterned structures for study of cell-surface
interactions. PMSE Preprints (2005), 93 252-253.
Krishnan, Sitaraman; Finlay, John A.; Hexemer, Alexander; Wang, Nick;
Ober, Christopher K.; Kramer, Edward J.; Callow, Maureen E.; Callow,
James A.; Fischer, Daniel. Interaction of ulva and navicula
marine algae with surfaces of pyridinium polymers with fluorinated
side-chains. Polymer Preprints (American Chemical Society,
Division of Polymer Chemistry) (2005), 46(2), 1248-1249.
Lin, Qin; Krishnan, Sitaraman; Paik, Marvin; Busch, Peter; Ober,
Christopher K.; Hexemer, Alexander; Sohn, Karen E.; Kramer, Edward J.;
Kowalke, Greg L.; Wendt, Dean E. Semifluorinated triblock
copolymers as surface active components for multilayer marine
antifouling coatings. Polymer Preprints (American
Chemical Society, Division of Polymer Chemistry) (2005), 46(2),
635-636.
Krishnan, Sitaraman; Ober, Christopher K.; Ayothi, Ramakrishnan; Lin,
Qin; Paik, Marvin; Hexemer, Alexander; Kramer, Edward J.; Fischer,
Daniel. Hydrophobic and hydrophilic fluoropolymers as
non-adhesive interfaces in marine biofouling. Polymer Preprints
(American Chemical Society, Division of Polymer Chemistry)
(2005), 46(2), 613-614.
Ober, Christopher K.; You, Fengxiang; Li, Mingqi; Chao, Chiyang; Du,
Phong; Wiesner, Ulrich. Chemical strategies for control of phase
structure in block copolymers. Polymer Preprints (American
Chemical Society, Division of Polymer Chemistry) (2005),
46(2), 538.
* Galli, G.; Martinelli, E.; Chiellini, E.; Ober, C.
K.; Glisenti, A. ?œLow Surface Energy Characteristics of
Mesophase-Forming ABC and ACB Triblock Copolymers with Fluorinated B
Blocks??Molecular Crystals and Liquid Crystals (2005), 441(1),
211-226.
* Kim, Kyung-Min; Ayothi, Ramakrishnan; Ober,
Christopher K. ?œSynthesis, Characterization and Lithography Performance
of Photoacid Generator with Short Perfluoroalkyl Anion??Polymer
Bulletin (Heidelberg, Germany) (2005), 55(5), 333-340.
* Kousuke Tsuchiya, Seung Wook Chang, Nelson M.
Felix, Mitsuru Ueda and Christopher K. Ober, ?œLithography Based on
Molecular Glasses?? J. Photopolym. Sci. Tech., 18 (3): 431-434 2005.
* Young-Je Kwark, J. Pablo Bravo-Vasquez, Heidi B.
Cao, Hai Deng, and Christopher K. Ober, ?œSilicon Containing
Organic-Inorganic Hybrid Materials as EUV Photoresists?? J. Photopolym.
Sci. Tech., 18 (4): 481-487 2005.
Seung Wook Chang, Da Yang, Junyan Dai, Nelson Felix, Daniel Bratton,
Kousuke Tsuchiya, Young-Je Kwark, Juan-Pablo Bravo, Christopher K.
Ober, Heidi B. Cao and Hai Deng, ?œMaterials for Future Lithography??
Proceedings of SPIE, 5753 1 (2005).
Ober, Christopher K.; Senaratne, Wageesha; Sengupta, Prabuddha; Baird,
Barbara. Patterned structures for study of cell-surface
interactions. PMSE Preprints (2005), 93 252-253.
* Wageesha Senaratne, Cindy Harnett, Prabuddha
Sengupta, Barbara Baird, Harold Craighead, Christopher K. Ober
?œMolecular Templates for Bio-specific Recognition by Low-Energy
Electron Beam Lithography?? Nanobiotechnology, 2005, 1(1), 23-34.
* Tianyue Yu, Qing Wang, Daniel S. Johnson, Michelle
D. Wang and Christopher K. Ober, ?œFunctional Hydrogel Surfaces: Binding
Kinesin Based Molecular Motor Proteins?? Adv. Functional Materials,
2005, 15, 1303-1309.
* W. Senaratne, Luisa Andruzzi and Christopher K.
Ober, ?œSelf-Assembled Monolayers and Polymer Brushes in Biotechnology:
Current Applications and Future Perspectives?? Biomacromolecules, 2005,
6, 2427-2448.
* Paik, Hyun-Jong; Kim, Young-Rok; Orth, Reid N.;
Ober, Christopher K.; Coates, Geoffrey W.; Batt, Carl A.
End-functionalization of poly(3-hydroxybutyrate) via genetic
engineering for solid surface modification. Chemical
Communications (Cambridge, United Kingdom) (2005), (15),
1956-1958.
Chang, Seung Wook; Felix, Nelson; Yang, Da;
Ramakrishnan, Ayothi; Ober, Christopher K. Lithography based on
calix[4]resorcinarene and related molecular glasses. Polymeric
Materials: Science and Engineering (2005), 92 131-132.
Yang, Da; Dai, Junyan; Li, Mingqi; Ober, Christopher K. The
convergence of top-down and bottom-up nanofabrication: formation of 3D
structures. Proceedings of SPIE-The International Society for Optical
Engineering (2005), 5592 (Nanofabrication: Technologies,
Devices, and Applications), 12-26.
* Luisa Andruzzi, Wageesha Senaratne, Alexander
Hexemer, Erin D. Sheets, B. Ilic, David Holowka, Edward J. Kramer,
Barbara Baird and Christopher K. Ober, ?œExploring the Potential of
Oligoethylene Glycol Containing Polymer Brushes as Bio-selective
Surfaces?? Langmuir, 2005, 21, 2495-2504.
2004
Horie K, Baron M, Fox RB, He J, Hess M, Kahovec J, Kitayama T, Kubisa
P, Marechal E, Mormann W, Stepto RFT, Tabak D, Vohlidal J, Wilks ES,
Work WJ, Allegra G, Baron M, Fradet A, Hatada K, He J, Hess M, Horie K,
Jenkins AD, Jin JI, Jones RG, Kahovec J, Kitayama T, Kratochvil P,
Kubisa P, Marcechal E, Meisel I, Metanomski WV, Moad G, Mormann W,
Penczek S, Rebelo LP, Rinaudo M, Schopov I, Schubert M, Shibaev VP,
Slomkowskj S, Stepto RFT, Tabak D, Vohlidal J, Wilks ES, Work WJ,
Dorfner K, Fréchet MJ, Harris WI, Hodge P, Nishikubo T, Ober CK,
Reichmanis E, Sherrington DC, Tomoi M, Wohrle D ?œDefinitions of terms
relating to reactions of polymers and to functional polymeric materials
- (IUPAC Recommendations 2003)?? Pure And Applied Chemistry 76 (4):
889-906 APR 2004
Goto, Takeshi; Li, Mingqi; Ober, Christopher. Patternable block
copolymers: from synthesis to application. Uchu Kozo,
Zairyo Shinpojumu (2005), Volume Date 2004,
20th 1-5.
Galli, G.; Ragnoli, M.; Bertolucci, M.; Ober, C. K.; Kramer, E. J.;
Chiellini, E. Fluorinated 2-vinylcyclopropane copolymers as low
surface energy materials. Macromolecular
Symposia (2004), 218(Current Topics in Polymer Science and
Technology), 303-312.
* C. Coenjarts and C. K. Ober, ?œThree Dimensional
2-Photon Microfabrication of Silicone Elastomers?? Chem. Mater,
(Communication); 2004 16(26); 5556-5558.
* Chinedum Osuji, Paulo J. Ferreira, Guoping Mao,
Christopher K. Ober, John B. Vander Sande, Edwin L. Thomas, ?œAlignment
of Self-Assembled Hierarchical Microstructure in Liquid Crystalline
Diblock Copolymers Using High Magnetic Fields?? Macromolecules, 2004
37(26); 9903-9908.
* Mao, Yu; Felix, Nelson M.; Nguyen, Peter T.; Ober,
Christopher K.; Gleason, Karen K. Towards all-dry lithography:
Electron-beam patternable poly(glycidyl methacrylate) thin films from
hot filament chemical vapor deposition. Journal of Vacuum Science &
Technology, B: Microelectronics and Nanometer Structures--Processing,
Measurement, and Phenomena (2004), 22(5), 2473-2478.
Young-Je Kwark, J. Pablo Bravo-Vasquez, and
Christopher K. Ober, Heidi B. Cao, Hai Deng, and Robert Meagley,
?œSilicon-based Resists for EUV Lithography?? Advances in Imaging and
Materials Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh
and R. Chen, eds., 25 (2004).
V. Jakubek, C. K. Ober, E. Robertson III, T. J. Markely, A. Abdourasak
and J. A. Marsella, ?œHexafluoro- and Trifluoromethyl Carbinols in
157-nm Photoresists?? Advances in Imaging and Materials Processes, SPE
Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds., 71
(2004).
Alyssandrea H. Hamad, Frank Houlihan, Larry Seger, Chun Chang,
Christopher K. Ober, ?œThe Role of Small Molecules As Fluorinated
Dissolution Inhibitors?? Advances in Imaging and Materials Processes,
SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds.,
83 (2004).
E. Robertson III, T. J. Markely, A. Abdourasak, V. Jakubek, C. K. Ober,
?œTransparency and Etch Resistance of Several Polymers Derived from
Trifluoroacetone?? Advances in Imaging and Materials Processes, SPE
Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds., 101
(2004).
Junyan Dai, Christopher K Ober, Sang Ouk Kim, Paul Nealey, Victoria
Golovkina, Jangho Shin, Lin Wang, Franco Cerrina, ?œSynthesis and
Evaluation of Novel Organoelement Resists for EUV Lithography??
Advances in Imaging and Materials Processes, SPE Proceedings, H. Ito,
R. Varanasi, M. Khojasteh and R. Chen, eds., 109 (2004).
Yu Mao, K.K. Gleason, P.T. Nguyen, N. Felix, C. K. Ober, Chemical Vapor
Deposition of Polymeric Thin Films Combined with Supercritical CO2
Development for Dry Lithography?? Advances in Imaging and Materials
Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R.
Chen, eds., 187 (2004).
Victor Q. Pham, Nelson M. Felix, Vladimir Jakubek, Jessie Mao, Karen
Gleason, Christopher K. Ober, ?œNew Photoresists and Processing Methods
for Supercritical Carbon Dioxide Development?? Advances in Imaging and
Materials Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh
and R. Chen, eds., 281 (2004).
Tianyue Yu, Christopher K. Ober, Stephan M. Kuebler, Wenhui Zhou, Seth
R. Marder and Joseph W. Perry, ?œThree-dimensional Microfabrication in
Chemically Amplified Positive Resists by Two-Photon Lithography??
Advances in Imaging and Materials Processes, SPE Proceedings, H. Ito,
R. Varanasi, M. Khojasteh and R. Chen, eds., 307 (2004).
* Birger Lange, Rudolf Zentel, Christopher Ober, Seth
Marder, ?œPhoto-processable polymer opals?? Chem. Mater., (2004),
16(25), 5286-5292.
* Sitaraman Krishnan, Young J. Kwark, Christopher K.
Ober, ?œFluoropolymers: Liquid Crystalline Properties, and Applications
in Lithography?? Chemical Record, 4(5), 315-330 (2004).
* Bae, Young C.; Ober, Christopher K.
?œPatternable block copolymers with high transparency at 157 nm:
Fluorocarbinol functionalized
poly(isoprene-b-cyclohexane).??nbsp; Polymer Bulletin
(Heidelberg, Germany) (2004), 52(5), 321-328.
* Luisa Andruzzi, Alexander Hexemer, Xuefa Li,
Christopher K. Ober, Edward J. Kramer, Giancarlo Galli, Emo Chiellini,
Daniel A. Fischer, ?œControl of Surface Properties Using Fluorinated
Polymer Brushes Produced by Surface-Initiated Controlled Radical
Polymerization?? Langmuir, (2004), 20(24), 10498-10506.
Rudolf Zentel and Christopher K. Ober, ?œTribute to
Helmut Ringsdorf?? Macromolecules, (2004), 37(23), 8485-8486.
Senaratne, Wageesha; Sengupta, Prabuddha; Jakubek, Vladimir; Baird,
Barbara; Ober, Christopher K. ?œBiomolecular patterned surfaces by
electron beam lithography.??Polymeric Materials: Science and
Engineering (2004), 91 361-362.
Kuebler, Stephen M.; Braun, Kevin L.; Stellacci,
Francesco; Bauer, Christina A.; Halik, Marcus; Zhou, Wenhui; Yu,
Tianyue; Ober, Christopher K.; Marder, Seth R.; Perry, Joseph W.
?œTwo-photon 3D lithography: Materials and applications.??Polymeric
Materials: Science and Engineering (2004), 91 342-343.
Krishnan, Sitaraman; Ober, Christopher K.; Lee,
Kristen L.; Angert, Esther R.; Hexemer, Alexander; Kramer, Edward J.
?œAntibacterial coatings based on quaternized poly(4-vinylpyridine)
block copolymers.??Polymeric Materials: Science and Engineering (2004),
91 814-815.
Galli, G.; Andruzzi, L.; Chiellini, E.; Li, X.; Ober, C. K.; Hexemer,
A.; Kramer, E. J. Structural organisation in polystyrene-based
semifluorinated block copolymers for low surface energy coatings.
Surface Coatings International, Part B: Coatings Transactions (2004),
87(B2), 77-82.
Ober, Christopher K.; Douki, Katsuji; Bae, Young C.; Dai, Junyan;
Conley, Will. ?œThe photopolymer science and technology award.??Journal
of Photopolymer Science and Technology (2004), 17(1), 7-10.
Murakami, Yasuharu; Coenjarts, Christopher A.; Ober, Christopher K.
?œPreparation and two-photon lithography of a sulfur containing resin
with high refractive index.??Journal of Photopolymer Science and
Technology (2004), 17(1), 115-118.
J. Pablo Bravo-Vasquez, Young-Je Kwark, and Christopher K. Ober, Heidi
B. Cao, Hai Deng, and Robert Meagley, ?œSilicon Backbone Polymers as EUV
Resists?? SPIE Proceedings, Proceedings of SPIE-The International
Society for Optical Engineering (2004), 5376 (Pt. 2, Advances in
Resist Technology and Processing XXI), 739-745.
Vladimir Jakubek, Eric A. Robertson III, Atteye H. Abdourazak, Thomas
J. Markley, John A. Marsella, Christopher K. Ober, ?œHexafluoroisopropyl
and Trifluoromethyl Carbinols in an Acrylate Platform for 157-nm
Chemically Amplified Resists?? Proceedings of SPIE-The International
Society for Optical Engineering (2004), 5376(Pt. 1, Advances in
Resist Technology and Processing XXI), 554-564.
Junyan Dai, Christopher K. Ober, ?œNovel Resists with Non-traditional
Compositions for EUV Lithography?? Proceedings of SPIE-The
International Society for Optical Engineering (2004), 5376(Pt. 1,
Advances in Resist Technology and Processing XXI), 508-516.
* Kempe, Michael D.; Kornfield, Julia A.; Ober,
Christopher K.; Smith, Steven D. ?œSynthesis and Phase Behavior of
Side-Group Liquid Crystalline Polymers in Nematic Solvents??
Macromolecules (2004), 37(10), 3569-3575.
* Z. S. Zhang, O.M. Wilson, M. Y. Efremov, E. A.
Olson, M. Zhang, P. V. Braun, C. Ober, W. Senaratne, M. Zhang & L.
H. Allen, "Heat Capacity Measurements of Two-Dimensional Self-Assembled
Monolayers On Polycrystalline Gold", Appl. Phys. Lett. v84 p5198 (2004).
* Mingqi Li, Katsuji Douki, Ken Goto, Xuefa Li,
Detlef M. Smilgies and Christopher K. Ober, ?œSpatially Controlled
Fabrication of Nanoporous Block Copolymers?? Chem. Mater., (2004),
16(20), 3800-3808.
Chi-Yang Chao, Xuefa Li and Christopher K. Ober,
?œDirecting Self-assembly in Macromolecular Systems: Hydrogen Bonding in
Ordered Polymers?? Pure Appl. Chem., Vol. 76, Nos. 7??, pp. 1337??343,
2004.
* Victor Q. Pham, Nagesh Rao, Christopher K. Ober,
?œSwelling and dissolution rate measurements of polymer thin films in
supercritical carbon dioxide?? J. Supercritical Fluids, (2004), 31(3),
323-328.
* J. Paik. C. Batt, G. Coates, C. K. Ober, ?œEnzymatic
surface-initiated polymerization: A novel approach for the in situ
solid phase synthesis of the biocompatible polymer,
poly[3-hydroxybutyrate]?? Biomacromolecules, 2004, 5, 889.
* Phong Du, Xuefa Li, Katsu Doki, Mingqi Li, Sol
Gruner, Detlef Smilgies, Uli Wiesner and Christopher Ober, ?œPhase
Selective Chemistry in Block Copolymer Thin Films?? Adv. Mater.,
16(12), 953 ??957 (2004).
* B. Ilic, H. G. Craighead, S. Krylov, W. Senaratne,
C. Ober and P. Neuzil, ?œAttogram detection using Nanoelectromechanical
Oscillators?? J. Appl. Phys., 95, 3694 (2004)
* Chi-Yang Chao, Xuefa Li, Christopher K. Ober and
Edwin L. Thomas, ?œOrientation in Hydrogen-bonded Side Chain Liquid
Crystalline Block Copolymers using Applied AC Electric Fields??
Advanced Functional Materials, 14(4), 364 ??370 (2004).
Kuebler, Stephen M.; Perry, Joseph W.; Marder, Seth
R.; Ober, Christopher K.; Braun, Kevin L.; Yu, Tianyue; Zhou, Wenhui.
High-sensitivity material systems for two-photon three dimensional
microfabrication. Proceedings of SPIE-The International Society for
Optical Engineering (2004), 5347 (Micromachining Technology for
Micro-Optics and Nano-Optics II), 111-117.
* Markley, T. J.; Marsella, J. A.; Robertson, E. A.,
III; Parris, G. E.; Zarkov, Z.; Jakubek, V.; Ober, C. K. ?œWetting
and dissolution studies of fluoropolymers used in 157 nm
photolithography applications.??Journal of Vacuum Science &
Technology, B: Microelectronics and Nanometer Structures--Processing,
Measurement, and Phenomena (2004), 22(1), 140-145.
* A. Hexemer, E. Sivaniah, E. J. Kramer, M. Xiang, X.
Li and C. K. Ober, ?œManaging Polymer Surface Structure Using Surface
Active Block Copolymers (SABC) in Block Copolymer Mixtures?? Journal of
Polymer Science Part B: Polymer Physics, 42(3), 2004, 411-420
* J. - S. Chen, C. K. Ober, M. D. Poliks, Y. Zhang,
U. Wiesner, C. Cohen, ?œControlled Degradation of Epoxy Networks:
Analysis of Crosslink Density and Glass Transition Temperature Changes
in Thermally Reworkable Thermosets?? Polymer, 2004, 45/6, 1939-195.
Ober, Christopher K.; Kwark, Young-Je;
Bravo-Vasquez, J.-Pablo; Dai, Junyan; Hamad, Alyssandrea, New
strategies for lithography at short wavelengths?? PMSE Preprints
(2004), 90 22.
2003
Galli, Giancarlo; Andruzzi, L.; Chiellini, E.; Li,
X.; Ober, C. K.; Hexemer, A.; Kramer, E. J. ?œBulk and surface
structures of polystyrene-based semifluorinated block copolymers for
low surface energy coatings.??nbsp; Fluorine in Coatings V, Conference
Papers, 5th, Orlando, FL, United States, Jan. 21-22, 2003 (2003), Paper
4/B, Paper 4/1-Paper 4/10.
* Victor Q. Pham, Robert J. Ferris, Alyssandrea
Hamad, Christopher K. Ober, ?œPositive-tone photoresist process for
supercritical carbon dioxide development?? Chem. Mater., 2003; 15 (26);
4893-4895.
* Vohra, Vaishali R.; Schmidt, Daniel F.; Ober,
Christopher K.; Giannelis, Emmanuel P. Deintercalation of a
chemically switchable polymer from a layered silicate
nanocomposite. Journal of Polymer Science, Part B:
Polymer Physics (2003), 41(24), 3151-3159.
Bizzarri, Ranieri; Chiellini, Federica; Ober, Christopher K.; Saltzman,
W. Mark; Solaro, Roberto; Chiellini, Emo. ?œMalolactonate polymers
and copolymers for biomedical applications.??Macromolecular
Symposia (2003), 197(7th World Conference on Biodegradable
Polymers & Plastics, 2002), 303-314.
Chiellini, Federica; Bizzarri, Ranieri; Ober, Christopher K.;
Schmaljiohann, Dirk; Yu, Tianyue; Saltzman, W. Mark; Solaro,
Roberto; Chiellini, Emo. ?œSurface patterning and biological
evaluation of semi-interpenetrated
poly(HEMA)/poly(alkyl-b-malolactonate)s.??nbsp; Macromolecular
Symposia (2003), 197(7th World Conference on Biodegradable
Polymers & Plastics, 2002), 369-379.
Ober, Christopher K.; Senaratne, Wageesha; Andruzzi, Luisa. ?œPatterned
surfaces through polymer brushes.??Polymer Preprints (American Chemical
Society, Division of Polymer Chemistry) (2003), 44(2), 228-229.
Thomas, Edwin L.; Osuji, Chinedum; Bita, Ion; Chao, Chi-Yang; Ober,
Christopher K. ?œSelf-assembled hydrogen bonded liquid-crystalline
diblock copolymers as tunable 1-D photonic crystals?? Polymeric
Materials Science and Engineering (2003), 89 86-87.
* Padma Gopalan, Xuefa Li, Mingqi Li, Christopher K.
Ober, Chad P. Gonzales, and Craig J. Hawker, ?œRod-Coil Block
Copolymers: An Iterative Synthetic Approach via Living Free Radical
Procedures?? Journal of Polymer Science, Part A: Polymer
Chemistry (2003), 41(22), 3640-3656.
Hamad, Alyssandrea H.; Houlihan, Francis M.; Seger, Larry; Chang, Chun;
Ober, Christopher K. Evaluation of fluorinated dissolution
inhibitors for 157-nm lithography. Proceedings of
SPIE-The International Society for Optical Engineering (2003),
5039(Pt. 1), 558-568.
Vohra, Vaishali R.; Liu, Xiang-Qian; Douki, Katsuji; Ober, Christopher
K.; Conley, Will; Zimmerman, Paul; Miller, Daniel. Fluoropolymer
resists for 157 nm lithography. Proceedings of
SPIE-The International Society for Optical Engineering (2003),
5039(Pt. 1), 539-547.
Kwark, Young-Je; Bravo-Vasquez, Juan-Pablo; Ober, Christopher K.; Cao,
Heidi B.; Deng, Hai; Meagley, Robert P. Novel silicon-containing
polymers as photoresist materials for EUV
lithography. Proceedings of SPIE-The International
Society for Optical Engineering (2003), 5039 1204-1211.
Dai, Junyan; Ober, Christopher K.; Kim, Sang-Ouk; Nealey, Paul F.;
Golovkina, Victoria; Shin, Jangho; Wang, Lin; Cerrina, Franco.
Synthesis and evaluation of novel organoelement resists for EUV
lithography. Proceedings of SPIE-The International Society for Optical
Engineering (2003), 5039 1164-1172.
Ober, Christopher K.; Youngblood, Jeffrey P.; Andruzzi, Luisa;
Senaratne, Wageesha; Li, Xuefa; Hexemer, Alexander; Kramer, Edward J.
?œBlock copolymers as surface modifiers: Synthesis, characterization and
relevance to fouling release and biostability.??Polymeric Materials
Science and Engineering (2003), 88 612-613.
Youngblood, Jeffrey P.; Andruzzi, Luisa; Senaratne, Wageesha; Ober,
Christopher K.; Callow, Jim A.; Finlay, John A.; Callow, Maureen E. New
materials for marine biofouling resistance and release:
Semi-fluorinated and PEGylated block copolymer bilayer coatings.
Polymeric Materials Science and Engineering (2003), 88 608-609.
Andruzzi, Luisa; Senaratne, Wageesha; Hexemer, Alexander; Ober,
Christopher K.; Kramer, Edward J. PEG-based biostable surfaces by
controlled radical polymerization. Polymeric Materials Science and
Engineering (2003), 88 604-605.
Senaratne, Wageesha; Andruzzi, Luisa; Sheets, Erin D.; Holowka, David;
Ilic, Bojan; Hexemer, Alexander; Baird, Barbara; Kramer, Edward J.;
Ober, Christopher K. ?œExploring the potential of surface grown
PEG-polymer brushes for biotechnology applications.??Polymeric
Materials Science and Engineering (2003), 88 337-338.
* Tianyue Yu and Christopher K. Ober, ?œMethods For
The Topographical Patterning and Patterned Surface Modification Of
Hydrogels Based On Hydroxyethyl Methacrylate?? Biomacromolecules,
(2003), 4(5), 1126-1131.
* Christopher K. Ober, Mingqi Li, Katsuji Douki, Ken
Goto, Xuefa Li, ?œLithographic Patterning with Block Copolymers?? J.
Photopolym. Sci. Tech., 16(3), 347-350 (2003).
* V. Jakúbek, X. Liu, V. R. Vohra, K. Douki, Y.
Kwark, Christopher K. Ober, T. J. Markley, E. A. Robertson III, R. V.
C. Carr, J. A. Marsella, W. Conley, D. Miller, and P. Zimmerman,
?œStrategies for High Transparency Acrylate Resists for 157 nm
Lithography?? J. Photopolym. Sci. Tech., 16(4), 573-580 (2003).
* Stephen M. Kuebler, Kevin L. Braun, Wenhui Zhou, J.
Kevin Cammack, Tianyue Yu, Christopher K. Ober, Seth R. Marder, Joseph
W. Perry, "Design and application of high-sensitivity two-photon
initiators for three-dimensional microfabrication", Journal of
Photochemistry and Photobiology A: Chemistry 158 (2003) 163-170.
* Jeffrey P. Youngblood, Luisa Andruzzi, Christopher
K. Ober, Alexander Hexemer, Edward J. Kramer, James A. Callow,
John A. Finlay and Maureen E. Callow, ?œCoatings from Side-Chain
Ether-Linked Poly(Ethylene Glycol) and Fluorocarbon Polymers For The
Control Of Marine Biofouling?? Biofouling, 19, 91-98 (2003).
* Padma Gopalan, Yuanming Zhang, Xuefa Li, Ulrich
Weisner, Christopher K. Ober, ?œLiquid Crystalline Rod-Coil Block
Copolymers By Stable Free Radical Polymerization: Synthesis, Morphology
and Rheology?? Macromolecules, (2003), 36(9), 3357-3364.
* Hilmar Koerner, Yixia Luo, Xuefa Li, Claude Cohen,
Ronald C. Hedden and C. K. Ober, ?œStructural Studies of
Extension-Induced Mesophase Formation in Poly(diethylsiloxane)
Elastomers: In Situ Synchrotron WAXS and SAXS?? Macromolecules,
(2003), 36(6), 1975-1981.
* Tianyue Yu, Christopher K. Ober, Stephan M.
Kuebler, Wenhui Zhou, Seth R. Marder and Joseph W. Perry,
?œThree-dimensional Microfabrication in a Chemically Amplified Positive
System using 2-Photon Lithography?? Adv. Mater., 15(6), 2003, 517-521.
2002
* Weibel, Gina L.; Ober, Christopher K. ?œAn
overview of supercritical CO2 applications in microelectronics
processing??Microelectronic Engineering (2002), 65(1-2), 145-152.
* Chinedum Osuji, Chi-Yang Chao, Ion Bita,
Christopher K. Ober, Edwin L. Thomas, ?œTemperature Dependent Photonic
Band Gap in a Self-Assembled Hydrogen Bonded Liquid Crystalline Diblock
Copolymer?? Adv. Functional Mater., 12, 753-758 (2002).
Yu, Tianyue; Chiellini, Federica; Schmaljohan, Dirk;
Solaro, Roberto; Ober, Christopher Kemper. Microfabrication of
hydrogels for biomedical applications. Proceedings of SPIE-The
International Society for Optical Engineering (2002), 4690
854-860.
Hamad, Alyssandrea H.; Bae, Young C.; Liu,
Xiang-Qian; Ober, Christopher Kemper; Houlihan, Francis M.; Dabbagh,
Gary; Novembre, Anthony E. Fluorinated dissolution inhibitors for
157-nm lithography. Proceedings of SPIE-The International Society for
Optical Engineering (2002), 4690 477-485.
Pham, Victor Quan; Weibel, Gina L.; Rao, Nagesh G.;
Ober, Christopher Kemper. Dissolution rate measurements for resist
processing in supercritical carbon dioxide. Proceedings of SPIE-The
International Society for Optical Engineering (2002), 4690 425-431.
Vohra, Vaishali Raghu; Douki, Katsuji; Kwark,
Young-Je; Liu, Xiang-Qian; Ober, Christopher Kemper; Bae, Young C.;
Conley, Will; Miller, Daniel; Zimmerman, Paul. Highly transparent
resist platforms for 157-nm microlithography: an update. Proceedings of
SPIE-The International Society for Optical Engineering (2002),
4690 84-93.
Huang, Wu-Song; Kwong, Ranee W.; Moreau, Wayne M.;
Lang, Robert; Medeiros, David R.; Petrillo, Karen E.; Mahorowala, Arpan
P.; Angelopoulos, Marie; Lin, Qinghuang; Dai, Junyan; Ober, Christopher
Kemper. Applicaton of blends and side chain Si-O copolymers as
high-etch-resistant sub-100-nm e-beam resists. Proceedings of SPIE-The
International Society for Optical Engineering (2002),
4690 432-441
Dai, Junyan; Ober, Christopher Kemper; Wang, Lin;
Cerrina, Franco; Nealey, Paul F. Organoelement resists for EUV
lithography. Proceedings of SPIE-The International Society for Optical
Engineering (2002), 4690 1193-1202.
* Xuefa Li, Luisa Andruzzi, E. Chiellini, G. Galli,
Christopher K. Ober, Alexander Hexemer, Edward J. Kramer, Daniel A.
Fischer, ?œSemifluorinated Aromatic Side-Group Polystyrene-Based Block
Copolymers: Bulk Structure and Surface Orientation Studies??
Macromolecules, (2002), 35(21), 8078-8087.
* J.-S. Chen, M. D. Poliks, C. K. Ober, Y. Zhang, U.
Wiesner, E. Giannelis, ?œStudy of the Exfoliation Mechanism and
Thermal-mechanical Properties of Surface-initiated Epoxy
Nanocomposites?? Polymer, (2002), 43(18), 4895-4904.
* Gopalan, Padma; Andruzzi, Luisa; Li, Xuefa; Ober,
Christopher K., ?œFluorinated mesogen-jacketed liquid-crystalline
polymers as surface-modifying agents: design, synthesis and
characterization?? Macromolecular Chemistry and Physics (2002),
203(10/11), 1573-1583.
* Bizzarri, Ranieri; Chiellini, Federica; Ober, Chris
K.; Saltzman, W. Mark; Solaro, Roberto, ?œInfluence of structural
parameters on the ring-opening polymerization of new alkyl
malolactonate monomers and on the biocompatibility of polymers
therefrom?? Macromolecular Chemistry and Physics (2002), 203(10/11),
1684-1693.
Victor Q. Pham, Peter T. Nguyen, Gina L. Weibel,
Robert J. Ferris, Christopher K. Ober, ?œPositive-Tone Resist For
Supercritical CO2 Processing?? Polymer Preprints, (2002), 43(2),
885-886.
Luisa Andruzzi, Alexander Hexemer, Xuefa Li,
Christopher K. Ober, Edward J. Kramer, Giancarlo Galli, Emo Chiellini,
?œSurface Control Using Polymer Brushes Produced By Controlled Radical
Polymerization?? Polymer Preprints, (2002), 43(2), 76-77.
Padma Gopalan, Xuefa Li, Christopher K. Ober, Craig
Hawker , ?œSynthesis Of Rod -Coil Diblock Copolymers Via Nitroxide
Functionalized Mesogenic Rod Segments?? Polymer Preprints, (2002),
43(2), 110-111.
Tianyue Yu, Christopher K. Ober, Stephen M. Kuebler,
Wenhui Zhou, Seth R. Marder, and Joseph W. Perry, ?œTwo-photon Positive
Tone Lithography for Three-dimensional Microfabrication?? Polymeric
Materials: Science and Engineering (2002), 87 411.
* L. Andruzzi, E. Chiellini, G. Galli, X. Li, S.
Kang, C. K. Ober, ?œEngineering Low Surface Energy Polymers through
Molecular Design: Synthetic Routes to Fluorinated Polystyrene-Based
Block Copolymers?? J. Mater. Chem., (2002), 12(6), 1684-1692.
Kim, Young-Rok; Paik, Hyun-Jong; Ober, Christopher
K.; Coates, Geoffrey W.; Batt, Carl A. Enzymatic
surface-initiated polymerization of 3-(R)-hydroxybutyryl-coenzyme A:
Surface modification of a solid substrate with a biodegradable and
biocompatible polymer: poly(3-hydroxybutyrate). Polymer Preprints
(American Chemical Society, Division of Polymer Chemistry) (2002),
43(1), 706-707.
Kwark, Young-Je; Douki, Katsuji; Vohra, Vaishali;
Liu, Xiangqian; Conley, Wil; Zimmermann, Paul; Ober, Christopher K.
Tetrafluorophenols: New functional structures for 157 nm lithography.
Polymer Preprints (American Chemical Society, Division of Polymer
Chemistry) (2002), 43(1), 480-481.
Chao, Chiyang; Ober, Christopher K.; Osuji,
Chinedum; Thomas, Edwin L. Hydrogen-bonded side-chain liquid
crystalline block copolymers for photonic bandgap
materials. Polymer Preprints (American Chemical
Society, Division of Polymer Chemistry) (2002), 43(1), 13-14.
* Ober, Christopher K.; Douki, Katsuji; Vohra,
Vaishali R.; Kwark, Young-Je; Liu, Xiang-Qian; Conley, Will; Miller,
Daniel; Zimmerman, Paul. New strategies for high resolution
photoresists. Journal of Photopolymer Science and Technology (2002),
15(4), 603-611.
* Wenhui Zhou, Stephen M. Kuebler, Kevin L. Braun,
Tianyue Yu, J. Kevin Cammack, Christopher K. Ober, Joseph W. Perry,
Seth R. Marder, ?œAn Efficient Two-Photon Photoacid and Its Application
to 3D Microfabrication In Positive-Tone Resists?? Science, 296, 1106
??109 (2002).
* C. K. Ober, ?œPerspectives: Self-assembly: Persistence Pays Off?? Science, 296, 859 (2002).
* Y. C. Bae*, K. Douki, T. Yu, J. Dai, D.
Schmaljohann, H. Koerner, C. K. Ober*, W. Conley, ?œTailoring
Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of
Hexafluoroisopropyl Alcohol to Photoresist Backbones?? Chem Mater.,
(2002), 14(3), 1306-1313.
* G. Weibel and C. K. Ober, ?œProcessing Polymers in
Supercritical CO2?? in Encyclopedia of Materials: Science and
Technology, K. Buschow, R. W. Cahn, M. C. Flemins, B. Ilschner, E. J.
Kramer and S. Mahajan, eds., supplement, Elsevier, New York (2002)
* Chen, J.-S.; Ober, C. K.; Poliks, M. D.
?œCharacterization Of Thermally Reworkable Thermosets: Materials For
Environmentally Friendly Processing and Reuse??Polymer (2002),
43(1), 131-139.
2001
Yu, Tianyue; Ching, Philip; Ober, Christopher K.;
Deshpande, Shreeram; Puligadda, Rama. ?œDevelopment of a bond
contribution model for structure: property correlations in dry etch
studies??Proc. SPIE-Int. Soc. Opt. Eng. (2001), 4345 (Pt. 2,
Advances in Resist Technology and Processing XVIII), 945-951.
* Chiellini, F.; Bizzarri, R.; Ober, C. K.;
Schmaljohann, D.; Yu, T.; Solaro, R.; Chiellini, E. ?œPatterning Of
Polymeric Hydrogels For Biomedical Applications??Macromol. Rapid
Commun. (2001), 22(15), 1284-1287.
Bae, Y. C.; Ober, C. K.
?œFluorocarbinol-containing acrylic (co)polymers with high transparency
at 157 nm.??Polym. Prepr. (Am. Chem. Soc., Div. Polym. Chem.)
(2001), 42(2), 403-404.
* Y. C. Bae, K. Douki, T. Yu, J. Dai, D.
Schmaljohann, S. Kang, K. Kim, H. Koerner, W. Conley, D. Miller, R.
Balasubramanian, S. Holl, and C. K. Ober, ?œRejuvenation of 248 nm
Resist Backbones in 157 nm Lithography, J. Photopolym. Sci. Tech.
(2001), 14(4), 613-620.
* H. G. Pryce Lewis, G. L. Weibel, C. K. Ober and K.
K. Gleason, ?œSupercritical carbon dioxide as the development medium for
patterning fluorocarbon films?? Chem. Vap. Deposition, 7, 195-197
(2001).
* Kazutake Takada, Padma Gopalan, Christopher K. Ober
and Héctor D. Abruña, ?œSynthesis, Characterization and Redox Reactivity
of Novel Quinone Containing Polymers?? Chem. Materials, 2001; 13(9);
2928-2932.
* D. Diaz, J. E. Hudson, G. D. Storrier, H. D Abruña,
N. Sundararajan and C. K. Ober, ?œLithographic Applications of Redox
Probe Microscopy?? Langmuir (2001), 17(19), 5932-5938.
* P. Gopalan and C. K. Ober, ?œHighly Reactive
2,5-Disubstituted Styrene Based Monomer Polymerized via Stable Free
Radical Polymerization: Effect of Substitution and Liquid Crystallinity
on Polymerization?? Macromolecules (2001), 34(15), 5120-5124.
* E. Sivaniah, J. Genzer, G. H. Fredrickson, E. J.
Kramer, M. Xiang, X. Li, C. Ober and S. Maganov, ?œPeriodic Surface
Topology of Three-Arm Semifluorinated Alkane Monodendron Diblock
Copolymers?? Langmuir, (2001), 17(14), 4342-4346.
C. K. Ober, ?œTribute to Robert W. Lenz?? Macromolecules, 34(14) 4667 (2001).
* T. Koga and S. Zhou, B. Chu, J. L. Fulton, S. Yang,
C. K. Ober and B. Erman, ?œNew High Pressure Cell for Simultaneous
Synchrotron Small-Angle X-ray Scattering and Laser Light Scattering
Measurements?? Rev. Sci. Instrum., 72(6), 2679-2685 (2001).
* C. K. Ober and G. Mao, ?œLiquid Crystalline Block
Copolymers?? in Encyclopedia of Materials: Science and Technology, K.
Buschow, R. W. Cahn, M. C. Flemins, B. Ilschner, E. J. Kramer and S.
Mahajan, eds, T. Lodge volume editor, Elsevier, New York (2001).
* R. H. Colby, L. M. Nentwich, S.R. Clingman and C.
K. Ober, ?œDefect-mediated Creep Of Structured Materials?? Europhys.
Lett., 54(2), 269 ??74 (2001)
Xuefa Li, Yushi Ando, Christopher K. Ober, Easan
Sivaniah, Edward J. Kramer, and Dan Fisher, ?œSurface Self-Assembly in
Side Chain Modified Block Copolymers?? PMSE Preprints, 84 870 (2001).
M. Li, X. Li and C. K. Ober, "Conducting Block
Copolymers with Novel Architectures: Synthesis and Characterization",
PMSE Preprints, 84 715 (2001).
Doris U. Pospiech, Dieter E. Jehnichen, Antje
Gottwald, Liane Häussler, Ulrich Scheler, Peter Friedel, Wolfram
Kollig, Christopher K. Ober, Xuefa Li, Alexander Hexemer, Edward J.
Kramer, Daniel A. Fischer, ?œInvestigation Of The Microphase Separation
In Semifluorinated Polyesters?? PMSE Preprints, 84 314 (2001).
Seok Ho Kang, Maoliang Xiang, Xuefa Li, Federica
Chiellini, Christopher K. Ober, Edward J. Kramer, ?œSurface Active Block
Copolymers (SABC): Biofouling Resistant Coatings From Chemically
Modified Polymers?? PMSE Preprints, 84 14 (2001).
Victor Q. Pham, Gina L. Weibel, Alyssandrea H. Hamad
and Christopher K. Ober, ?œProcessing Fluorinated Photoresists In
Supercritical CO2: Environmentally Responsible Processes For The
Computer Industry?? PMSE Preprints, 84 49 (2001).
2000
* Osuji, C. O.; Chen, J. T.; Mao, G.; Ober, C. K.;
Thomas, E. L. ?œUnderstanding and Controlling the Morphology of
Styrene-Isoprene Side-Group Liquid Crystalline Diblock Copolymers??
Polymer (2000), 41(25), 8897-8907.
* Moriya, K.; Seki, T.; Nakagawa, M.; Mao, G.; Ober,
C. K. ?œPhotochromism of 4-Cyanophenylazobenzene in Liquid
Crystalline-Coil AB Diblock Copolymers: The Influence of
Microstructure.??Macromol. Rapid Commun. (2000), 21(18), 1309-1312.
Schmaljohann, D.; Bae, Y.; Weibel, G. L.; Hamad, A.
H.; Ober, C. K. ?œDesign Strategies For 157-Nm Single-Layer
Photoresists: Lithographic Evaluation Of A Poly(A-Trifluoromethyl Vinyl
Alcohol) Copolymer.??Proc. SPIE-Int. Soc. Opt. Eng. (2000), 3999
(Pt. 1, Advances in Resist Technology and Processing XVII), 330-334.
* T. Hayakawa, J. Wang, N. Sundararajan, M. Xiang, X.
Li, B. Glüsen, G. C. Leung, M. Ueda and C. K. Ober, ?œPhotoswitching
Surfaces: New Photopatternable, Self-Organizing Fluoropolymers
Containing Acid Labile Semifluorinated Groups?? J. Phys. Org. Chem.
2000; 13: 787??95.
* T. Hayakawa, J. Wang, M. Xiang, X. Li, M. Ueda, C.
K. Ober, J. Genzer, E. Sivaniah, E. J. Kramer, D. A. Fischer, ?œThe
Effect of Changing Molecular End Groups on Surface Properties:
Synthesis and Characterization of Poly(Styrene-b-Semifluorinated
Isoprene) Block Copolymers with -CF2H End Groups?? Macromolecules,
(2000) 33(21), 8012-8019.
* J. Genzer, E. Sivaniah, E. J. Kramer, J. Wang, M.
Xiang, K. Char, C. K. Ober, R. A. Bubeck, D. A. Fischer, M. Graupe, R.
Colorado, Jr., O. E. Shmakova and T. R. Lee, ?œMolecular orientation of
single and 2-armed monodendron semifluorinated chains on ?œsoft??and
?œhard??surfaces studied using NEXAFS?? Macromolecules, 33(16) 6068-6077
(2000).
* M. Xiang, X. Li, C. K. Ober, K. Char, J. Genzer, E.
Sivaniah, E. J. Kramer, D. A. Fischer, ?œSurface Stability in
Liquid-Crystalline Block Copolymers with Semifluorinated Monodendron
Side Groups?? Macromolecules, 33(16) 6106-6119 (2000).
* Bunning, T. J.; Adams, W.; Ober, C. K.; Korner,
H. ?œSynchrotron Radiation For Probing the Electric Field
Alignment of LC Macromolecules and Polymers.??Int. J. Polym.
Mater. (2000), 45(3-4), 451-501.
Y. C. Bae, J. Dai, G. L. Weibel and C. K. Ober,
?œImageable Polymers Using Fluorocarbinol Containing Polydienes??
Polymer Preprints 2000, 41(2), 1586.
X. Li, M. Xiang, C. K. Ober, E. Sivaniah, E. J.
Kramer, J. Genzer and D. Fisher, ?œSurface and Interface Behavior of
Semifluorinated Liquid Crystalline Block Copolymers?? PMSE Preprints,
83 428 (2000).
P. Gopolan, X. Li, C. K. Ober and C. Hawker, ?œStable
Free Radical Polymerization of Liquid Crystalline Monomers: Effect of
Preordering?? PMSE Preprints 2000, 83, 430.
D. Schmaljohann and C. K. Ober, ?œInvestigation on
the Copolymerization Behavior of α Trifluoromethyl vinylacetate?? PMSE
Preprints 2000, 83, 434.
D. Schmaljohann, A. H. Hamad, G. L. Weibel and C. K.
Ober, ?œFluorinated Polyvinylalcohols as a Photoresists for 157 nm
Lithography?? PMSE Preprints 2000, 83, 445.
T. Yu, F. Chiellini, D. Schmaljohann, R. Solaro and
C. K. Ober, ?œMicrofabrication Of Hydrogels As Polymer Scaffolds For
Tissue Engineering Applications?? Polymer Preprints 2000, 41(2), 1699.
J. S. Chen, C. K. Ober, and M. D. Poliks,
?œReworkable Thermosets: Enabling Disassembly of Microelectronic
Components?? Polymer Preprints 2000, 41(2), 1842
G. L. Weibel, H. G. Pryce Lewis, K. K. Gleason
and C. K. Ober, ?œPatternable Fluorocarbon Low-? Dielectrics
Developed Using Supercritical CO2?? Polymer Preprints 2000, 41(2), 1838.
Seok Ho Kang, C. K. Ober and E. J. Kramer,
?œSynthesis And Characterization Of Diblock Copolymers Containing
Surface Modifying Moieties For Non-Biofouling Materials?? Polymer
Preprints 2000, 41(2), 1521.
* P. Friedel, D. Pospiech, D. Jehnichen, J. Bergmann,
C. K. Ober, ?œPolyesters with Semifluorinated Side Chains: A Proposal
for the Solid-State Structure?? Journal of Polymer Science: Part B:
Polymer Physics, 38, 1617??625 (2000)
D. Schmaljohann, Y. Bae, J. Dai, G. L. Weibel, A. H.
Hamad, and C. K. Ober, ?œFundamental Studies of Fluoropolymer
Photoresists for 157 nm Lithography?? J. Photopolym. Sci.
Technol. (2000), 13(3), 451-458.
Q. Lin, M. Angelopoulos, K. Babich, D. Medeiros, N.
Sundararajan, G. Weibel, C. Ober, ?œDiffusion And Distribution Of
Photoacid Generators In Thin Polymer Films?? Mater. Res. Soc. Symp.
Proc. (2000), 584 (Materials Issues and Modeling for Device
Nanofabrication), 155-162.
* C. K. Ober, ?œScience Perspective: Shape Persistence
of Synthetic Polymers?? Science, 2000 April 21; 288: 448-449.
* Jeyaprakash, J. D.; Samuel, S.; Dhamodharan, R.;
Ober, Christopher K. ?œA solvent-free method for the synthesis of
block copolymers with fluorinated pendant groups by a hydrosilylation
reaction.??nbsp; J. Polym. Sci., Part A: Polym. Chem.
(2000), 38(7), 1179-1183.
J. S. Chen, C. K. Ober, and M. D. Poliks,
?œReworkable Thermosets: the Decomposition Mechanism and Development
Network Breakdown of Epoxies with Tertiary Ester Links?? Polym. Mater.
Sci. Eng. (2000), 82 357-358.
* Boeker, Alexander; Reihs, Karsten; Wang, Jianguo;
Stadler, Reimund; Ober, Christopher K. ?œSelectively Thermally Cleavable
Fluorinated Side Chain Block Copolymers: Surface Chemistry and Surface
Properties?? Macromolecules (2000), 33(4), 1310-1320.
* Genzer, Jan; Sivaniah, Easan; Kramer, Edward J.;
Wang, Jianguo; Koerner, Hilmar; Xiang, Maoliang; Char, Kookheon; Ober,
Christopher K.; DeKoven, Benjamin M.; Bubeck, Robert A.; Chaudhury,
Manoj K.; Sambasivan, Sharadha; Fischer, Daniel A. ?œThe
Orientation of Semifluorinated Alkanes Attached to Polymers at the
Surface of Polymer Films.??Macromolecules (2000),
33(5), 1882-1887.
* Genzer, Jan; Sivaniah, Easan; Kramer, Edward J.;
Wang, Jianguo; Koerner, Hilmar; Char, Kookheon; Ober, Christopher K.;
DeKoven, Benjamin M.; Bubeck, Robert A.; Fischer, Daniel A.;
Sambasivan, Sharadha. ?œTemperature Dependence of Molecular
Orientation on the Surfaces of Semifluorinated Polymer Thin
Films.??nbsp; Langmuir (2000), 16(4), 1993-1997.
* C. Ortiz, L. Belenky, C. K. Ober and E. J. Kramer,
?œMicrodeformation of a Polydomain, Smectic Liquid Crystalline
Thermoset?? J. Mater. Sci., (2000), 35(8), 2079-2086.
* Dierking, I.; Glusen, B.; Lagerwall, S. T.; Ober,
C. K. ?œSynchrotron X-Ray Study of the Smectic Layer Directional
Instability.??nbsp; Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat.
Interdiscip. Top. (2000), 61(2), 1593-1598.
* S. Yang, J. Wang, K. Ogino, S. Valiyaveettil and C.
K. Ober, ?œLow Surface Energy Fluoromethacrylate Block Copolymers with
Patternable Elements?? Chem. Mater., 2000, 12, 33-40.
* N. Sundararajan, S. Yang, J. Wang, K. Ogino, S.
Valiyaveettil, C. K. Ober, S. K. Obendorf and R. D. Allen,
?œSupercritical CO2 Processing for Sub-micron Imaging of
Fluoropolymers?? Chem. Mater., 2000, 12, 41-48.
1999
* M. C. Bignozzi, C. K. Ober and M. Laus, ?œLC Side
Chain-Coil Diblock Copolymers By Living Free Radical Polymerization??
Macromol. Rapid Commun., (1999), 20(12), 622-627.
* Osuji, Chinedum; Zhang, Yuanming; Mao, Guoping;
Ober, Christopher K.; Thomas, Edwin L. ?œTransverse Cylindrical
Microdomain Orientation in an LC Diblock Copolymer under Oscillatory
Shear.??Macromolecules (1999), 32(22), 7703-7706.
* S. Pragliola, C. K. Ober, P. Mathers, H. Jeon,
?œMesogen-Jacketed Liquid Crystalline Polymers via Stable Free Radical
Polymerization?? Macromol.Chem.Phys., (1999), 200(10), 2338-2344.
Opitz, Juliann; Allen, Robert D.; Breyta, Gregory;
Hofer, Donald C.; Sundararajan, Narayan; Ober, Christopher Kemper.
?œPolymer-platform-dependent characteristics of 193-nm
photoresists.??nbsp; Proc. SPIE-Int. Soc. Opt. Eng.
(1999), 3678(Pt. 2, Advances in Resist Technology and Processing XVI),
1096-1105.
Sundararajan, Narayan; Ogino, Kenji; Valiyaveettil,
Suresh; Wang, Jianguo; Yang, Shu; Kameyama, Atsushi; Ober, Christopher
Kemper; Allen, Robert D.; Byers, Jeffrey D. ?œBlock copolymers as
additives: a route to enhanced resist performance.??Proc. SPIE-Int.
Soc. Opt. Eng. (1999), 3678(Pt. 1, Advances in Resist Technology
and Processing XVI), 78-85.
* M. C. Bignozzi, C. K. Ober, A. J. Novembre and C.
Knurek, ?œLithographic Results of Electron Beam Photoresists Prepared by
Living Free Radical Polymerization?? Polym. Bulletin, 43, 93-100
(1999).
C. K. Ober, Chi-Yang Chao, M. Li and X. Li,
?œBalancing Liquid Crystallinity With Microphase Separation In Block
Copolymers?? Proc. ACS Div. Polym.Chem., 40(2), 482 (1999).
M.D. Kempe, W. Zhou, J. Kornfield, C. K. Ober and S.
Wu, ?œNematic Solutions of Large Molecular Weight Side-Group Liquid
Crystal Polymers?? Proc. ACS Div. Polym.Chem., 40(2), 488 (1999).
G. Barclay, N. Sundararajan, G. Xu, Z. Mao, C.
Paddock, and C. K. Ober, ?œThe Spatial Distribution of Photoacid
Generators in Photoresist Matrices?? Proc. ACS Div. Polym. Mat.: Sci.
& Eng., 81, 56 (1999)
C. K. Ober, N. Sundararajan, S. Yang, R. D. Allen,
K. Ogino, A. Kameyama, and T. Mates, ?œImproving Resist Performance with
Block Copolymer Additives?? Proc. ACS Div. Polym. Mat.: Sci. &
Eng., 81, 49 (1999)
S. Yang, C. K. Ober, ?œStable, Low Surface Energy
Fluoromethacrylate Block Copolymers With Lithographic Segments?? Proc.
ACS Div. Polym. Mat.: Sci. & Eng., 81, 481 (1999)
P. Gopalan, S. Pragliola, C. K. Ober, P. T. Mather,
H. G. Jeon, ?œMesogen-Jacketed Liquid Crystalline Polymers Via Stable
Free Radical Polymerization?? Proc. ACS Div. Polym.Chem., 40(2), 372
(1999).
C. K. Ober, M. Xiang, K. Char, J. Genzer, E.
Sivaniah, E. J. Kramer, and D. Fischer, ?œBlock Copolymers with Low
Surface Energy, Liquid Crystalline Segments: The Interplay of Surface
and Bulk Liquid Crystallinity?? Proc. ACS Div. Polym.Chem., 40(2), 976
(1999).
* N. Sundararajan, C. F. Keimel, N. Bhargava, C. K.
Ober, J. Opitz, R. D. Allen, G. Barclay, G. Xu, ?œIon Beam Analysis in
Lithography: Diffusion and Distribution Studies of Photoacid
Generators??J. Photopolym. Sci & Tech., 12(3) (1999) 457-468.
Osuji, Chinedum O.; Chen, John T.; Mao, Guoping;
Ober, Christopher K.; Thomas, Edwin L. ?œStructure development in
side group liquid crystalline diblock copolymers.??Mol. Interact.
Time-Space Organ. Macromol. Syst., Proc. OUMS '98 (1999), 9-28.
L. Crane; A. Torres-Filho; C. K. Ober; S. Yang; J.
Chen; R. W. Johnson. ?œDevelopment of reworkable underfills,materials,
reliability and processing.??nbsp; Int. Conf. Adhes. Joining Coat.
Technol. Electron. Manuf., Proc. Adhes. '98, 3rd (1998), 262-265.
Editor(s): Constable, James H. Publisher: Institute of Electrical
and Electronics Engineers, New York, N. Y.
Crane, Lawrence; Torres-Filho, Afranio; Ober,
Christopher K.; Yang, Shu; Chen, Jir-Shyr; Johnson, R. Wayne.
?œDevelopment of reworkable underfills, materials, reliability and
processing.??IEEE Trans. Compon., Packag. Technol. (1999),
22(2), 163-167.
S. Yang, J. Wang, K. Ogino,N. Sundararajan, C. K.
Ober, ?œSynthesis And Characterization Of Micropatternable Low Surface
Energy Block Copolymers?? Proc. ACS Div. Polym.Chem., 40(1), 100
(1999).
C. K. Ober, M. Xiang, K. Char, J. Genzer, E.
Sivaniah, E. J. Kramer, and D. Fisher, ?œLow Surface Energy
Materials: Liquid-Crystalline Block Copolymers with
Semifluorinated Monodendron Side Groups?? Proc. ACS Div. Polym. Mat.:
Sci. & Eng., 80, 416 (1999)
T. Hayakawa, J. Wang, N. Sundararajan, M. Xiang, X.
Li, B. Glüsen, M. Ueda and C. K. Ober, ?œNew Photopatternable,
Self-Organizing Materials for Tailored Surfaces?? Proc. ACS Div. Polym.
Mat.: Sci. & Eng., 80, 486 (1999)
* J. Wang and C. K. Ober, ?œSolid-State Crystalline
and Liquid Crystalline Structure of Semifluorinated 1-Bromoalkane
Compounds?? Liq. Cryst., 26(5), 637-648 (1999).
* S. R. Clingman, G. Mao, C. K. Ober, R. H. Colby, M.
Brehmer, R. Zentel, M. Bignozzi, M. Laus, A. Angeloni, and J. R.
Gillmor, ?œEffect of Polymer Architecture on Self-diffusion of LC
Polymer?? J. Polym. Sci.: Phys. Ed., 37(5), 405-414 (1999).
1998
* P. Schofield, C. Cohen, C. K. Ober, ?œSynthesis and
Mechanical Properties of Semi-Flexible Polymer Network?? Polym. Gels
and Networks, 6, 291 (1998).
* A. Merenga, S. V. Shilov, F. Kremer, G. Mao, C. K.
Ober, M. Brehmer, ?œMolecular Orientation And Dynamics In Ferroelectric
Diblock Copolymers Monitored By FT-IR Spectroscopy?? Macromolecules,
31, 9008-9012 (1998).
* Hupcey, M. A. Z., Ober, Christopher K. ?œCopolymer
Approach To Charge-Dissipating Electron Beam Resists?? J. Vac. Sci.
Technol., B(1998), 16(6), 3701-3704.
* Genzer, J.; Sivaniah, E.; Kramer, E. J.; Wang, J.;
Korner, H.; Xiang, M.-L.; Yang, S.; Ober, C. K.; Char, K.; Chaudhury,
M. K.; Dekoven, M.; Bubeck, R. A.; Fischer, D. A.; Sambasivan, S.,
?œSurfaces of semi-fluorinated block copolymers studied using NEXAFS.??
Mater. Res. Soc. Symp. Proc. (1998), 524 (Applications of Synchrotron
Radiation Techniques to Materials Science IV), 365-370.
* K. Ogino, J.-S. Chen and C. K. Ober, ?œSynthesis and
Characterization of Thermally Degradable Polymer Networks?? Chem.
Mater., 1998, 10(12), 3833-3838.
* C. Ortiz, M. Wagner, N. Bhargava, C. K. Ober and E.
J. Kramer, ?œDeformation of a Polydomain, Smectic Liquid Crystalline
Elastomer?? Macromolecules, 38, 8531-8539 (1998).
* M. D. Dadmun, S. R. Clingman, C. K. Ober and A. I.
Nakatani, ?œThe Flow Induced Structure in a Thermotropic Liquid
Crystalline Polymer as Studied by SANS?? J. Polym. Sci: Polym. Phys.
Ed., 36(17), 3017 (1998).
Hupcey, Maggie A. Z.; Angelopoulos, Marie; Gelorme,
Jeffrey D.; Ober, Christopher K. ?œHydroxyethyl Substituted
Polyanilines: Chemistry And Applications As Resists.??Annu. Tech. Conf.
- Soc. Plast. Eng. (1998), 56th(Vol. 2), 1355-1358.
Hupcey, Maggie A. Z.; Angelopoulos, Marie; Gelorme,
Jeffrey D.; Ober, Christopher K., ?œConducting Electron Beam Resists
Based On Polyaniline?? Proc. SPIE-Int. Soc. Opt. Eng. (1998),
3331(Emerging Lithographic Technologies II), 369-374.
J. A. Kornfield, B. Hirani, M. Kempe, C. Ober, Y.-U.
Kim and Y.-C. Chao, ?œSynthesis and Dynamics of Side-Group Liquid
Crystalline Polymers?? Proc. ACS Div. Polym. Chem., 39(2), 1020 (1998).
M. Xiang, S. Yang and C. K. Ober, ?œSemifluorinated
Groups as Building Blocks for Ordered Polymers?? Proc. ACS Div.
Polym.Chem., 39(2), 974 (1998).
N. Sundararajan, S. Valiyaveettil, K. Ogino, X.
Zhou, J. Wang, S. Yang and C. K. Ober, ?œBlock Copolymers as
Supercritical CO2 Developable Photoresists?? Proc. ACS Div. Polym.
Mat.: Sci. & Eng., 79, 130 (1998).
Pospiech, D. U.; Jehnichen, D.; Haeussler, L.;
Voigt, D.; Grundke, K.; Ober, C. K.; Wang, J.; Koerner, H.
Semifluorinated polyesters with low surface energy. Polym. Prepr. (ACS
Div. Polym. Chem.) (1998), 39(2), 882-883
* A. Shiota, H. Körner and C. K. Ober, ?œTwin Nematic
Phenylbenzoates in AC Electric Fields?? Liquid Crystals, (1998), 25(2),
199-206.
* J. Gunther, E. L. Thomas, S. Clingman and C. K.
Ober, ?œCurvature Driven Relaxation of Disclination Loops in Liquid
Crystals,??Polymer 39, 4497-4504 (1998).
* C. Ortiz, R. Kim, E. Rodighiero, C. K. Ober and E.
J. Kramer, ?œDeformation of a Polydomain, Liquid Crystalline Epoxy-Based
Thermoset?? Macromolecules (1998), 31(13), 4074-4088.
* C. Ortiz, C. K. Ober and E. J. Kramer, ?œStress
Relaxation of a Main-chain, Smectic, Polydomain Liquid Crystalline
Elastomer?? Polymer, (1998), 39(16), 3713-3718.
* S. Perutz, J. Wang, E. J. Kramer*, C. K. Ober* and
K. Ellis, ?œSynthesis and Surface Energy Measurement of
Semi-Fluorinated, Low-Energy Surfaces?? Macromolecules, (1998), 31(13),
4272-4276.
* S. Yang, J. Chen, H. Körner, T. Breiner, C. K. Ober
and M. Poliks , ?œReworkable Epoxies: Thermosets With Thermally
Cleavable Groups for Controlled Network Breakdown?? Chem. Mater.
(1998), 10(6), 1475-1482.
* G. Mao, J. Wang, C. K. Ober, M. Brehmer, E.L.
Thomas and M. J. O?™Rourke, ?œMicrophase-Stabilized Ferroelectric Liquid
Crystals (MSFLC): Bistable Switching of Ferroelectric Liquid
Crystal-Coil Diblock Copolymers?? Chem. Mater. (1998), 10(6),
1538-1545.
Ober, Christopher. Review of Handbook of Liquid
Crystal Research. Edited by Peter J. Collings (Swarthmore College) and
Jay S. Patel (Pennsylvania State University). J. Am. Chem. Soc. (1998),
120(11), 2693-2694.
C. K. Ober, K. Ogino, J. Wang, S. Valiyaveettil and
N. Sundararajan, ?œTailoring Polymer Thin Film Properties By Balancing
Selected Molecular Interactions?? Proc. ACS Div. Polym. Chem., 39(1),
727 (1998)
M. Abdallah, H. Skupin, J. Prigann, F. Kremer, S. V.
Shilov, G. Mao, C. K. Ober, M. Brehmer, ?œStructure and Mobility in
Ferroelectric Liquid Crystalline Diblock Copolymers?? Proceedings
Freiburger Arbeitstagung Flussigkristalle, 41, 1998.
* G. Mao and C. K. Ober, ?œBlock Copolymers Containing
Liquid Crystalline Segments - An Overview?? Handbook of Liquid Crystals
Vol. 3, D. Demus, J. Goodby, G.W. Gray, H.-W. Spie? , V. Vill, eds.,
pgs. 66-92, Wiley-VCH, Weinheim 1998, invited chapter.
* A. Shiota and C. K. Ober, ?œSmectic Networks
Obtained from Twin LC Epoxy Monomer: Mechanical Deformation of
Smectic Networks?? J. Polym. Sci.: Polym. Phys. Ed., 36, 31-38 (1998).
1997
N. Sundararajan, J. Wang, K. Ogino, A. Kameyama, G.
Mao, S. Valiyaveettil, C. K. Ober and R. D. Allen, ?œBlock Copolymers as
both Photoresists and Additives for 193 nm Imaging?? Proceedings of the
11th International SPE Conference on Photopolymers, McAfee, NJ, 59-69
(1997).
Kameyama, A.; Ober, C. K. ?œSynthesis and
self-assembly of block-type polyelectrolytes?? Kanagawa Daigaku Kogaku
Kenkyusho Shoho (1997), 20, 111-114.
Ortiz, C.; Kim, R.; Rodeghiero, E.; Kramer, E. J.;
Ober, C. K. ?œDeformation and fracture of a polydomain liquid
crystalline epoxy-based thermoset.??nbsp; Deform., Yield Fract. Polym.,
Int. Conf., 10th (1997), 125-128.
* R. Colby, C. K. Ober, G. Galli and M. Laus, ?œThe
Rheology of Smectic Mesophases?? Rheol. Acta, 36: (5) 498-504 1997.
* J. Wang and C. K. Ober, ?œSelf-Organizing Materials
with Low Surface Energy - Synthesis and Solid State Properties of
Semifluorinated Side Chain Ionenes?? Macromolecules, 30, 7560-7567
(1997).
* A. Shiota and C. K. Ober, ?œRigid Rod and Liquid
Crystalline Thermosets?? Prog. Polym. Sci., 22 (5), 975-1000 (1997).
* A. Shiota and C. K. Ober, ?œAnalysis of Smectic
Structure Formation in Liquid Crystalline Thermosets?? Polymer, 38(23),
5857-5867 (1997).
* Dai, Chi-An; Osuji, Chinedum O.; Jandt, Klaus D.;
Dair, Benita J.; Ober, Christopher K.; Kramer, Edward J.; Hui,
Chung-Yuen, ?œEffect of the monomer ratio on the strengthening of
polymer phase boundaries by random copolymers?? Macromolecules, 30
(22), 1997, 6727-6736
* A. Shiota, H. Körner and C. K. Ober, ?œLiquid
Crystalline Networks from 1,4-Benzenedicarboxylic acid
bis(4-cyanatomethylphenyl) esters?? Macromol. Chem. Phys., 198,
2957-2970 (1997).
* M. Muthukumar, C. K. Ober and E. L. Thomas,
?œCompeting Molecular Interactions and the Formation of Ordered
Structures on Different Length Scales in Polymers?? Science, 277,
1225-1232 (1997).
* G. Mao and C. K. Ober, ?œBlock Copolymers Containing
Liquid Crystalline Segments - An Overview?? Acta Polymerica, 1997, 50,
405-422.
* C. K. Ober, A. H. Gabor, P. Wetmore and R.D. Allen,
?œProcessing Imageable Polymers with Supercritical Carbon Dioxide?? Adv.
Mater., 9, 1039-1043 (1997).
* D. Barber, C. R. Pollock, L. L. Beecroft and C.K.
Ober, ?œAmplification by Optical Composites?? Optics Letters, 22(16),
1247 (1997).
M.A.Z. Hupcey, C. K. Ober, ?œPositive-Tone Conducting
E-Beam Resists?? Proc. SPIE-Int. Soc. Opt. Eng., 3048 (Emerging
Lithographic Technologies), 1997, pp. 100-104
S. Yang, J.-S. Chen, H. Körner, T. Breiner and C. K.
Ober, ?œDesign and Characterization of a New Reworkable Epoxy using
Solvent Free, Thermally Induced Network Breakdown?? Proc.
ACS Div. Polym. Chem., 38(2), 440 (1997).
J. Wang, N. Sundararajan and C. K. Ober, ?œUsing
Block Copolymer As Adhesion Promoters in Photoresists?? Proc. ACS Div.
Polym. Mat.: Sci. & Eng., 77, 443 (1997).
T. J. Bunning, W. W. Adams, V. V. Tsukruk, H. Körner
and C. K. Ober, X-ray Scattering and Molecular Associations of Cyclic
Siloxane-based Liquid Crystalline Macromolecules, Proc. ACS Div. Polym.
Chem., 38(2), 81 (1997).
* C. K. Ober, J. G. Wang and G. P. Mao, ?œOrder
within Order: Studies of Semifluorinated Block Copolymers??
Macromolecular Symposia, 118, 701-706 (1997).
* H. Körner, A. Shiota, C. K. Ober and M. Laus,
?œMixtures of Liquid Crystalline and Amorphous Dicyanates: Unusual
Curing Behavior and Mechanical Properties?? Chem. Mater., 1997, 9,
1588-1597.
* A. Shiota and C. K. Ober, ?œOrientation of Liquid
Crystalline Epoxies in AC Electric Fields?? Macromolecules, 30,
4278-4287 (1997).
* C. K. Ober, J. Wang, G. Mao, E. J. Kramer and E. L.
Thomas, ?œSimultaneous Organization on Different Length Scales in Liquid
Crystalline Block Copolymers?? Macromolecular Symposia, 117, 141-152
(1997).
* M. Brehmer, G. Mao, C. K. Ober*, R. Zentel*,
?œFerroelectric Block Copolymers?? Macromolecular Symposia, 117, 175-181
(1997).
* E. L. Thomas, J. T. Chen, M. J. O?™Rourke, C. K.
Ober and G. Mao, ?œInfluence of a Liquid Crystalline Block on
Microdomain Structure?? Macromolecular Symposia, 117, 241-256 (1997).
* L. L. Beecroft, N.A. Johnen and C.K. Ober,
?œCovalently Linked, Transparent Silica-Poly(imide) Hybrid Materials??
Polym. Adv. Tech., 8, 289-296 (1997).
* L. L. Beecroft and C. K. Ober, ?œAdvanced
Nanocomposite Materials for Optical Applications?? Chem. Mater., 9,
1302-1317 (1997).
* G. Mao, J. Wang, S. R. Clingman, C. K .Ober, E. L.
Thomas and J. T. Chen, ?œMolecular Design, Synthesis and
Characterization of Liquid Crystal-Coil Diblock Copolymers with
Azobenzene Side Groups?? Macromolecules, 30, 2556-2567 (1997).
* Jianguo Wang, Guoping Mao, C. K. Ober, and E. J.
Kramer, ?œLiquid Crystalline, Semifluorinated Side Group Block
Copolymers with Stable Low Energy Surfaces ??Synthesis, LC Structure
and Critical Surface Tension?? Macromolecules, 30, 1906-1914 (1997).
G. Mao, J. Wang, C. K. Ober, M. J. O?™Rourke, E. L.
Thomas, M. Brehmer and R. Zentel, ?œMicrophase stabilized ferroelectric
liquid crystal (MSFLC): Bistable switching of FLC-coil diblock
copolymers?? Polymer Preprints: Proc. ACS Div. Polym. Chem.38(1), 374
(1997)
J. Wang, G. Mao, C. K. Ober and E. J. Kramer,
?œSelf-Assembly of Fluorinated LC Block Copolymers with a Stable Low
Energy Surface?? Polymer Preprints: Proc. ACS Div. Polym. Chem.38(1),
953 (1997)
C. K. Ober, M. A. Z. Hupcey and A. H. Gabor, ?œNew
Methacrylate Block and Random Copolymers For Submicron Lithographic
Imaging?? Polymer Preprints: Proc. ACS Div. Polym. Chem.38(1), 477
(1997)
* L. L. Beecroft and C.K .Ober, ?œPolymers with
Tailored Refractive Index for Optical Applications?? JMS - Pure Appl.
Chem., A34(4), 437-50 (1997).
* C. K. Ober and G. Wegner,
?œPolyelectrolyte-Surfactant Complexes in the Solid-State: Facile
Building Blocks for Self-Organizing Materials?? Adv. Mater., 9, 17-31
(1997).
1996
* L. L. Beecroft, R. T. Leidner, C. K. Ober, D. B.
Barber, and C. R. Pollock, Better Ceramics Through Chemistry VII,
Eds. G.L. Wilkes, D.W. Schaefer, C. Sanchez and B. Coltrain, Mat.
Res. Soc. Symp. Proc., 1996, 435, p. 575-582.
* T. J. Bunning, H. Körner, V. V. Tsukruk, C. M.
McHugh, C. K. Ober and W. W. Adams, ?œStructural Characterization of
Biphenyl Ester-Based LC Molecules: Peculiarities of Cyclic
Siloxane-Based Materials?? Macromolecules, 29, 8717-8725 (1996).
* V. V Tsukruk, T. J. Bunning, H. Körner, C. K. Ober,
W. W. Adams, ?œMolecular Association in Nematic Phases of Cyclic Liquid
Crystal Oligomers?? Macromolecules, 29, 8706-8716 (1996).
* H. Körner, A. Shiota and C. K. Ober, ?œThe
Processing Of LC Thermosets In Orienting External Fields?? MRS
Proceedings, Liquid Crystals for Advanced Technologies, T. J. Bunning,
S. H .Chen, W. Hawthorne, T. Kajiyama and N. Koide, ed. MRS
Symposium Proceedings 425, 149-160 (1996).
H. Körner, A. Shiota and C. K. Ober,
?œControlled-Order Thermosets for Electronic Packaging?? SPE/ANTEC ??6
Proceedings, 426 (1996).
A. H. Gabor, C. K. Ober, R. D. Allen and P.
Gallagher-Wetmore, ?œBlock and Random Copolymer Resists Designed for 193
nm Lithography and Environmentally Friendly Supercritical CO2
Development?? Advances in Resist Technology and Processing XIII, R. R.
Kunz, ed. SPIE Proceedings 2724, 410-427 (1996).
Gallagher-Wetmore, P.; Ober, C. K.; Gabor, A. H.;
Allen, R. D. ?œSupercritical fluid processing: opportunities for
new resist materials and processes?? Proc. SPIE-Int. Soc. Opt.
Eng. (1996), 2725 (Metrology, Inspection, and Process Control for
Microlithography X), 289-299.
* D. Xu, R. H. Crepeau, C. K.Ober, J. H. Freed,
?œMolecular Dynamics of a Liquid Crystalline Polymer Studied by
Two-Dimensional Fourier Transform and CW ESR?? J. Phys. Chem., 1996,
100, 15873-15885.
* D. Xu, E. Hall, C. K.Ober, J. K. Moscicki, J. H.
Freed, ?œTranslational Diffusion in Polydispersed Polymer Samples
Studied by Dynamic Imaging of Diffusion ESR?? J. Phys. Chem., 1996,
100, 15856-15866.
* D. Xu, D. E. Budil, C. K.Ober, J. H. Freed,
?œRotational Diffusion and Order Parameters of a Liquid Crystalline
Polymer Studied by ESR: Molecular Weight Dependence?? J. Phys.
Chem., 1996, 100, 15867-15872.
C. K. Ober, H. Körner, A. Shiota and M. Laus, ?œThe
Curing of Dicyanate Ester Liquid Crystalline Thermosets?? Angew.
Makromol. Chem., 240, 59-66 (1996).
J. Wang, C. K. Ober and E. J. Kramer, ?œSynthesis of
Novel Low Surface Energy Semifluorinated Alkyl Side Chain Ionenes??
Polymer Preprints: Proc. ACS Div. Polym. Chem.37(2), 815 (1996).
S. Perutz, J. Wang, C. K. Ober and E. J. Kramer,
?œAdhesion between Hydrolyzed Surfaces of PDMS Networks?? Polymer
Preprints: Proc. ACS Div. Polym. Chem.37(2), 45 (1996).
* A. H. Gabor and C. K. Ober, ?œGroup Transfer
Polymerization of tert-Butyl Methacrylate and
3-Methacryloxypropylpentamethyldisiloxane: Synthesis and
Characterization of Homopolymers, Random and Block Copolymers?? Chem.
Mater., 8, 2272-2281, (1996).
* A. H. Gabor, L.C. Pruette and C. K. Ober,
?œLithographic Properties of Poly(tert-butyl methacrylate)-based Block
and Random Copolymer Resists Designed for 193 nm Wavelength Exposure
Tools?? Chem. Mater., 8, 2282-2290, (1996).
* C. K. Ober and A. H. Gabor, ?œBlock Copolymers as
Lithographic Materials?? J. Photopolymer Sci. & Tech., 9(1),
1-12, (1996).
* J. T. Chen, E.L. Thomas, C.K.Ober and G.-P. Mao,
?œNovel Self-Assembled Smectic Phases in Rod-Coil Block Copolymers??
Science, 273, 343-346 (1996).
* H. Körner, A. Shiota, C.K. Ober and T. Bunning,
?œOrientation-On-Demand Thin Films: Curing of Liquid Crystalline
Networks in AC Electric Fields?? Science, 272, 252-255 (1996).
* A. Shiota and C. K. Ober, ?œSynthesis and Curing of
Novel LC Twin Epoxy Monomers for Liquid Crystal Thermosets?? J. Polym.
Sci.: Polym. Chem. Ed., 34, 1291 (1996).
H. Körner and C.K. Ober, ?œTuning Physical Properties
And Mesophase Behavior In Liquid Crystalline Thermoset Mixtures?? Proc.
ACS Div. Polym. Mat.: Sci. & Eng., 74, 133 (1996).
A. Shiota and C. K. Ober, ?œBuilding a Layered
Structure from Liquid Crystalline Thermosets Materials Using an A.C.
Electric Field?? Proc. ACS Div. Polym. Mat.: Sci. & Eng., 74,
137 (1996).
H. Körner and C. K. Ober, ?œTransient Structures of
LC Polymers in Electric Fields Observed by Synchrotron Radiation??
Polymer Preprints: Proc. ACS Div. Polym. Chem.37(1), 58 (1996).
* D. R. Iyengar, S. M. Perutz, C. Dai, C. K. Ober and
E. J. Kramer, ?œSurface Segregation Studies of Fluorine-Containing
Diblock Copolymers?? Macromolecules, 29, 1229-1234 (1996).
* N. A. Johnen, L. L. Beecroft and C. K. Ober ,
?œFormation Of Transparent Silica-Polymer Hybrids Based On
Siloxane-Containing Poly(Imides)?? in J. Hedrick and J. Labadie, ed.,
Recent Advances in Step Growth Polymerization, ACS Symposium Series
624, American Chemical Society, Washington, DC 1996.
1995
* L. L. Beecroft and C.K. Ober, ?œNovel Ceramic
Particle Synthesis For Optical Applications: Dispersion
Polymerized Preceramic Microspheres As Size Templates For Fine Ceramic
Powders?? Adv. Mater., 1995, 7, 1009-1012.
M. Laus, R. Pernozzoli, H. Körner and C.K. Ober,
?œComportamento Dinamico-Meccanico di Network Triazinici Liquido
Cristallini?? Proceedings of the 12th Italian AIM Congress on the
Science and Technology of Macromolecules, 661, (1995).
* E. Reichmanis, C.K. Ober, S. MacDonald, T.
Iwayanagi, and T. Nishikubo, ed., Microelectronics Technology:
Polymers in Advanced Imaging and Packaging, ACS Symposium Series 614,
American Chemical Society, Washington, DC 1995.
* A. Gabor and C.K. Ober, ?œSilicon-containing Block Copolymers as Microlithographic Resists?? pg. 281-298.
E. Hall, C. K. Ober, R.A. Gaudiana and E. Kolb,
?œMelt Diffusion in Liquid Crystalline Polymers: Rigid Rod vs.
Semi-Rigid Rod Model Systems?? 53rd Annu. Tech. Conf. - Soc.
Plast. Eng., 2, 1950-4, 1995.
A. Shiota and C. K. Ober, ?œTwin Mesogen Liquid
Crystalline Thermosets?? Polymer Preprints: Proc. ACS Div. Polym.
Chem.36(2), 348 (1995).
H. Körner and C. K. Ober, ?œCuring Of Liquid
Crystalline Networks In Electric Fields: Preparation of Oriented
Thin Films?? Proc. ACS Div. Polym. Mat.: Sci. & Eng., 73, 456
(1995).
L. L. Beecroft, C. K. Ober, D. B. Barber, C. R.
Pollock, J. L. Mass, and J. M. Burlitch, ?œOptical Composite Materials??
Proc. ACS Div. Polym. Mat.: Sci. & Eng., 73, 162 (1995).
* G. Sacripante, C.K. Ober, T. Bluhm, M. Panettoni
and L. Alexandru, ?œThermotropic Liquid Crystalline Polymers with Low
Thermal Transitions. II. Low Melting Thermotropic Liquid
Crystalline Homo- and Co-Polyesters?? J. Polym. Sci.: Part
A: Polym. Chem., 33, 1913-1916 (1995).
S. Clingman and C.K. Ober, ?œStar Branched LC
Polyethers?? Proc. ACS Div. Polym. Mat.: Sci. & Eng., 72, 238
(1995).
A.H. Gabor, M. Chan and C.K. Ober ?œSynthesis of
Poly(t-Butyl Methacryate) Based Block and Random Copolymers for 193 nm
Lithography, Proc. ACS Div. Polym. Mat.: Sci. & Eng., 72, 104
(1995).
C. K. Ober and N. A. Johnen, ?œPreparation Of
Polyimide - Silica Organic / Inorganic Hybrids?? Polymer Preprints:
Proc. ACS Div. Polym. Chem.36(1), 715 (1995).
* S.G. McNamee, T.J. Bunning, S.S. Patnaik, W. W.
Adams, and C.K. Ober, ?œThe Effect of Electric and Magnetic Fields on
the Melt Organization of a Nematic Cyclic Siloxane Liquid Crystal??
Liquid Crystals, 18(5), 787-794, (1995).
* E. Hall, A. A. Robinson, S.G. McNamee, C.K. Ober,
Ya. S. Freidzon, ?œNematic-Smectic Biphase of a Main-Chain Liquid
Crystalline Polyether?? J. Mat. Sci., 30(8), 2023-2028 (1995).
* S. S. Hwang, C. K. Ober, S. Perutz, D. Iyengar, B.
Schneggenburger and E. J. Kramer, ?œBlock Copolymers With Low Surface
Energy Segments: Fluorinated and Siloxane Modified Blocks?? Polymer,
36(6), 1321-1325 (1995).
* J. T. Chen, E. L. Thomas, S. S. Hwang and C. K.
Ober, ?œThe Zig-Zag Morphology of a Poly(styrene-b-hexyl isocyanate)
Rod-Coil Block Copolymer?? Macromolecules, 28 (5), 1688-1697 (1995).
1994
A. H. Gabor, M. Y. Chan and C. K. Ober, ?œBlock
Copolymers for Resist Applications?? Proceedings of the 10th
International SPE Conference on Photopolymers, Ellenville, NY, 339 -
342 (1994).
* J. R. Gillmor, R. H. Colby, E. Hall and C. K. Ober,
?œViscoelastic Properties of a Model Main-Chain Liquid Crystalline
Polyether?? J. Rheol., 38, 1623 (1994).
* N. Johnen, H. K. Kim and C. K. Ober, ?œPolyphenylene
Copolymers as Materials for Microelectronics?? in H. Ito, S.
Tagawa and K. Horie, ed., Polymeric Materials for Microelectronic
Applications, ACS Symposium Series 579, American Chemical Society,
Washington, DC 1994.
* C. A. Dai, K. H. Dai, C. K.Ober, E. J. Kramer,
C.-Y. Hui and L. W. Jelinski, ?œReinforcement of Polymer Interfaces with
Random Copolymers?? Phys. Rev. Let., 73(18), 2472 (1994).
* A. H. Gabor, E. A. Lehner, G. Mao, L. A.
Schneggenburger and C. K. Ober, ?œSynthesis and Lithographic
Characterization of Block Copolymer Resists Consisting of Both
Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks??
Chem. Mater., 6, 927 (1994)
* S.G. McNamee, C.K. Ober, T.J. Bunning, C.M. McHugh
and W.W. Adams, ?œProbing the Electric Field Alignment of a Thermotropic
Liquid Crystal with Synchrotron Radiation?? Liq. Cryst., 17, 179-190
(1994).
* D. G. Park, M.H.E. Martin, J.M. Burlitch, C.K.
Ober, O.B. Cavin, W.D. Porter and C. R. Hubbard, ?œCrystallization of
Precursors to Forsterite and Cr-Doped Forsterite?? J. Am. Ceram. Soc.,
77, 33-40 (1994).
D. Xu, J.K. Moscicki, D. Budil, J.H. Freed, E. Hall
and C.K.Ober, ?œESR Studies of Molecular Dynamics of a Crystalline
Polyether?? Polymer Preprints: Proc. ACS Div. Polym. Chem.35(1), 327
(1994).
* S. G. Mcnamee, C. K. Ober, L. W. Jelinski, E. Ray,
Y. Xia, and D. Grubb, ?œToward Single Fiber Diffraction Of Spider
Dragline Silk From Nephila Clavipes?? in D. Kaplan, W. Adams, B.
Farmer, and C. Viney, ed., ?œSilk Polymers: Materials Science and
Biotechnology?? ACS Symposium Series 544, American Chemical Society,
Washington, DC (1994).
1993
* T.J. Bunning, S.G. McNamee, C.M. McHugh, S. S.
Patnaik, C.K. Ober, and W.W. Adams, ?œSynchrotron X-Ray Radiation
(CHESS) Study Of Electric-Field Induced Changes In The Structure Of
Thermotropic Side-Chain Liquid Crystals??in MRS Symp. Proc. 307,
311-316, Ed., D.L. Perry, N.D. Shinn, R.L., Stockbauer, K.L. D'Amico,
and L.J. Terminello, Materials Research Society, Pittsburgh, PA, 1993.
A. Gabor, E. Lehner, G. Mao, C.K.Ober, T. Long, B.
Schell and R. Tiberio, ?œHydrosiloxane modified styrene-diene block
copolymer resists?? Proc. SPIE-Int. Soc. Opt. Eng.:
Advances in Resist Technology and Processing X, 1925, 499-506 (1993).
C.K. Ober, E.L. Thomas and J.Moore, ?œConference
Report on Synthesis Of Macromolecules with Precisely Controlled
Structures for New Materials?? Trends in Polymers, 1(12), 406 (1993).
C.K.Ober, ?œSynthetic Studies Of Poly(phenylene) and
Its Copolymers For Low Dielectric, Thin Films?? Proc. Int. Workshop. on
Functional Organic Materials, pg. 7, Korea University, Seoul, Korea
(1993).
Ya. S. Freidzon, H. Zhong and C.K.Ober, ?œThermosets
Based On Blends Of Liquid Crystalline Polymers And Mesogenic
Dicyanates?? Polymer Preprints: Proc. ACS Div. Polym. Chem.34(2), 698
(1993).
N. A. Johnen, H.K. Kim and C.K.Ober, ?œDevelopment of
New Composite Materials based on Siloxane-containing Poly(imides)??
Polymer Preprints: Proc. ACS Div. Polym. Chem.34(2), 392 (1993).
A.H. Gabor and C.K.Ober, ?œGroup Transfer
Polymerization of Silicon-containing Methacrylates: Model
Polymerization and Synthesis of Block Copolymers?? Polymer Preprints:
Proc. ACS Div. Polym. Chem.34(2), 576 (1993).
G. P. Mao, S.R. Clingman, C.K.Ober and T.E. Long,
?œSynthesis and Characterization of Liquid Crystal/Coil Diblock
Copolymers Containing Azobenzene Moieties?? Polymer Preprints: Proc.
ACS Div. Polym. Chem.34(2), 710 (1993).
A. Robinson, S.G. McNamee, Ya. S. Freidzon and
C.K.Ober, ?œNovel Liquid Crystalline Thermosets: Microstructural
Evolution of an LC Mesophase During the Curing Process?? Polymer
Preprints: Proc. ACS Div. Polym. Chem.34(2), 576 (1993)
C. K. Ober, M. H. E. Martin and L. Beecroft,
?œPolymer Precursors to Silicate Ceramics: Studies Of Ceramic
Formation?? Polymer Preprints: Proc. ACS Div. Polym. Chem.34(1), 256
(1993).
A. H. Gabor, E.A. Lehner, T. E. Long, G. Mao, E. C.
Rauch, B. A. Schell, and C.K.Ober, ?œHydrosilylation of Styrene-Isoprene
Block Copolymers?? Polymer Preprints: Proc. ACS Div. Polym. Chem.34(1),
284 (1993).
H. K. Kim, G. Yin and C.K. Ober, ?œSynthesis and
Characterization of Polyphenylene-Silica Hybrid Materials via Sol-Gel
Processing?? Polymer Preprints: Proc. ACS Div. Polym. Chem.34(1), 298
(1993).
* E. Hall, C. K. Ober, E. J. Kramer, R. H. Colby, and
J. R. Gillmor, ?œDiffusion and Melt Viscosity of a Main-Chain Liquid
Crystalline Polyether?? Macromolecules, 26, 3764-3771 (1993).
* H.K. Kim and C.K. Ober, ?œDevelopment Of
Poly(Phenylene)-Based Materials For Thin Film Applications:
Optical Waveguides And Low Dielectric Materials?? J. Macromol. Sci. -
Pure and Appl. Chem., A30(12), 877-897 (1993).
* G.G. Barclay and C.K. Ober, ?œLiquid Crystalline and
Rigid-Rod Networks?? Prog. Polym. Sci., 18, 899-945 (1993).
* E. Hall, C.K. Ober, and G. Galli, ?œThe Temperature
Dependence of Nematic Liquid Crystalline Polymer Melt Diffusion?? Liq.
Cryst., 14, 1351 (1993).
* G. Galli, S. G. McNamee, and C. K. Ober, ?œAn
Investigation Of The Smectic-Isotropic Transition In A Side-Chain
Liquid Crystal Polymer By Synchrotron Radiation X-Ray Diffraction?? J.
Polym. Sci.: Polym. Phys. Ed., 31, 773-777 (1993).
* R.H. Colby, J.R. Gillmor, G. Galli, M.Laus,
C.K.Ober and E. Hall, ?œLinear Viscoelasticity of Side-Chain Liquid
Crystalline Polymers?? Liq. Cryst., 13, 233 (1993).
* T. E. Mates, C.K. Ober and R. Norwood,
?œConductivity and Third-Order Nonlinear Optical Measurements of
Polymers with Distyrylbenzene and Diphenylbutadiene Segments?? Chem.
Mater., 5(2), 217-221 (1993).
1992
* C. K. Ober, E. Hall and G. Galli, ?œThe
Investigation of Melt Diffusion In Liquid Crystalline Polymers by
Forward Recoil Spectrometry?? Chim. Ind. (Milan)., 74 (8/9), 579-84
(1992).
* T. E. Mates and C.K. Ober, ?œNew Liquid Crystal
Polyethers and Polyesters Based on Diphenylbutadiene Mesogens?? J.
Polym. Sci.: Polym. Chem. 30, 2541 (1992).
* H. K. Kim, S. Kahn, T. Mates, G. G. Barclay, and C.
K. Ober, ?œDevelopment Of New Polymeric Materials For Linear
Waveguides?? Electronic Packaging Materials Science VI, Mat. Res. Soc.
Symp. Proc., 264, 347 (1992).
C.K. Ober and R. A. Weiss, ?œLiquid Crystalline Polymers?? Condensed Matter News, 1(7), 20 (1992).
A.H. Gabor, E.A. Lehner, G. Mao, L. A.
Schneggenburger and C.K. Ober, ?œHydrosilation of Styrene-butadiene
Block Copolymers?? Polymer Preprints: Proc. ACS Div. Polym. Chem.33(2),
136 (1992).
T.J. Bunning, S.G. McNamee, H.Klei, E. T. Samulski,
C.K.Ober and W.W. Adams, ?œSynchrotron X-ray Studies of Electric field
Alignment of Liquid Crystalline Siloxanes?? Polymer Preprints: Proc.
ACS Div. Polym. Chem.33(1), 315 (1992).
* S. McNamee, G. Galli and C.K. Ober, ?œTime-resolved
X-ray diffraction from Liquid Crystalline Systems: Thermotropic
Phase Transitions and the Effect of Applied Electric Fields?? Complex
Fluids, Mat. Res. Soc. Symp. Proc., 248, 101 (1992).
* E. Hall, C.K.Ober, E.J. Kramer, R.H. Colby, J.R.
Gillmor and G. Galli, ?œMelt Diffusion in Model Liquid Crystalline
Polymers?? Complex Fluids, Mat. Res. Soc. Symp. Proc., 248, 113 (1992).
* M.H.E. Martin, C. K. Ober, C.R. Hubbard, W.D.
Porter and O.B.Cavin, ?œPoly(methacrylate) Precursors to Forsterite??
J.Am. Cer. Soc., 75, 1831 (1992).
* G. G. Barclay, S. McNamee, C.K. Ober, K. Papathomas
and D. Wang, ?œLiquid Crystalline Epoxy Thermosets: Mechanical and
Magnetic Alignment?? J. Polym. Sci.: Polym. Chem. Ed., 30,
1845-1853 (1992).
* G. G. Barclay, C.K. Ober, K. Papathomas and D.
Wang, ?œLiquid Crystalline Epoxy Thermosets: Synthesis And
Characterization?? J. Polym. Sci.: Polym. Chem. Ed., 30,
1831-1843 (1992).
* H. K. Kim, C. R. Hove, and C. K. Ober, ?œSynthesis
of Novel Fluorinated ?-Conjugated Silicon-containing Polymers:
Polysilynes and Polysilanes?? JMS-Pure Appl. Chem., 29, 787 (1992).
* G. G. Barclay, C.K. Ober, K. Papathomas and D.
Wang, ?œRigid-rod Thermosets based on 1,3,5-Triazine Linked Aromatic
Ester Segments?? Macromolecules, 25, 2947 (1992).
* H.K. Kim and C.K. Ober, ?œAcid-catalyzed
Photoaromatization of Cyclohexadiene-1,2-diol Derivatives into
Polyphenylene?? Polym. Bull., 28(1), 33 (1992).
1991
G. G. Barclay, C. K. Ober, K.I. Papathomas and D.W.
Wang, ?œTriazine Rigid-rod Networks?? Polymer Preprints: Proc. ACS Div.
Polym. Chem., 32(2), 336 (1991).
M.H.E. Martin and C.K.Ober, ?œMethacrylate Precursors
to Oxide Glasses and Ceramics?? Polymer Preprints: Proc. ACS Div.
Polym. Chem., 32(2), 534 (1991).
* G. G. Barclay and C.K. Ober, ?œLiquid Crystalline
Networks as Materials for Microelectronics?? Materials Science of High
Temperature Polymers for Microelectronics, Mat. Res. Soc. Symp. Proc.,
227, 281 (1991).
* G. G. Barclay, C.K. Ober, K. Papathomas and D.
Wang, ?œCuring and Alignment of Liquid Crystalline Thermosets??
Electronic Packaging Materials V, Mat. Res. Soc. Symp. Proc., 203, 265
(1991).
* T. Mates and C. K. Ober, pg. 497-515, ?œModel
Polymers with Distyrylbenzene Segments for Third-Order Nonlinear
Optical Properties?? in Materials for Nonlinear Optics, S.R.
Marder, J.E. Sohn and G. D. Stucky, ed., ACS Symposium Series 455,
American Chemical Society, Washington, DC (1991).
T. Mates and C. K. Ober, ?œThermotropic Polymers with
Conjugated Distyrylbenzene and Diphenylbutadiene Segments, Polymer
Preprints: Proc. ACS Div. Polym. Chem., 32, 204 (1991).
1990
* C. K. Ober, A. Delvin and T. L. Bluhm,
?œDynamic X-ray Diffraction Studies of Liquid-Crystalline Polyesters??
J. Polym. Sci.: Polym. Phys., 28, 1057-1062 (1990).
* A. Misyan and C. K. Ober, ?œLiquid Crystalline
Copolyethers based on Mixed Mesogens?? Polym.Bull., 23, 535-542 (1990).
* T. Mates, C. K. Ober, B. Angelopoulos and H.
Martin, ?œEnvironmentally Stable Polymers From Soluble Intermediates??
Advanced Electronic Packaging Materials, Mat. Res. Soc. Symp. Proc.,
167, 123 (1990).
* C.K.Ober, ?œDispersion Copolymerization In
Non-Aqueous Media?? Makromol. Chem., Macromol. Symp., 35/36, 87 (1990).
* R. A. Weiss and C. K. Ober, ed., Liquid-Crystalline
Polymers, . ACS Symposium Series 435, American Chemical Society,
Washington, DC (1990).
* C. K. Ober, S. McNamee, A. Delvin and R.
Colby, pg. 220-240, ?œChemical Heterogeneity in LC
Polyesters??nbsp;
* C. K. Ober and R. A. Weiss, pg. 1-16, ?œCurrent Topics in Liquid-Crystalline Polymers??
* T. Mates and C. K. Ober, ?œNew Thermotropic
Polyesters from Distyrylbenzene Bisphenols?? J. Polym.
Sci.: Letters, 28, 331-339 (1990).
H. Martin and C. K. Ober, ?œOrganometal Polymer
Precursors to Glass-Ceramic Composites?? Proc. ACS Div. Polym.
Mat.: Sci. & Eng., 58, 908 (1990).
G.G. Barclay, C. K. Ober, K. Papathomas and D. Wang,
?œLiquid Crystalline Epoxy Networks?? Proc. ACS Div. Polym. Mat.:
Sci. & Eng., 63, 356 (1990).
G.G. Barclay, S.G. McNamee and C. K. Ober,
?œMechanical And Magnetic Orientation Of Liquid Crystalline Epoxy
Networks?? Proc. ACS Div. Polym. Mat.: Sci. & Eng., 63, 387
(1990).
E. Angelopoulos, C. K. Ober and E. J. Kramer, ?œMelt
Diffusion in Model LC Polymers?? Proc. ACS Div. Polym. Mat.: Sci.
& Eng., 63, 450 (1990).
1989
* A. Delvin, C. K. Ober and T. L. Bluhm, ?œStudies of
Liquid Crystalline Polymer Phase Transitions Using Synchrotron
X-Radiation?? Macromolecules, 22, 498 (1989).
* C. K. Ober, ?œSimulations of 1H-NMR Spectra of
Polymers with Varying Tacticities?? J. Chem. Ed., 66 (8), 645 (1989).
C. K. Ober and S. McNamee, ?œChemical Heterogeneity
In LC Polyesters?? Polymer Preprints: Proc. ACS Div. Polym. Chem., 30,
485 (1989).
1988
* A. Delvin and C. K. Ober, ?œLiquid Crystalline
Polyesters by Staged-Addition Polycondensation?? Polym. Bull., 20, 45
(1988).
A. Delvin, C. K. Ober and T. L. Bluhm,
?œSynchrotron Radiation Studies of Model Liquid Crystalline
Polyesters?? Proc. ACS Div. Polym. Mat.: Sci. & Eng.,
58, 1029 (1988).
1987
C. K. Ober, ?œThe Formation of Monodisperse Polymer
Microspheres from Styrene and Styrene-based Systems, Polymer Preprints:
Proc. ACS Div. Polym. Chem., 28, 248 (1987)
* F.M.Winnik, M.A.Winnik, S.Tazuke and C.K.Ober,
?œSynthesis and Characterization of Pyrene-Labelled
(Hydroxypropyl)Cellulose and its Fluorescence in Organic Solvents??
Macromolecules, 20(1), 38 (1987).
* C.K.Ober and K.P.Lok, ?œThe Formation of Large
Monodisperse Copolymer Particles by Dispersion Polymerization??
Macromolecules, 20, 268 (1987).
* C.K.Ober and M.L.Hair, ?œThe Effect of Temperature
and Initiator Levels on the Dispersion Polymerization of Polystyrene??
J. Polym.Sci.: Chem. Ed., 25, 1395 (1987).
* C.K.Ober and T.L.Bluhm, ?œThermotropic Liquid
Crystalline Polymers: The Effect of Molecular Composition on
Physical Properties?? Chapter 4.3 in Current Topics in Polymer Science
, Vol. 1, S. Inoue, L.A.Utracki, and R.M.Ottenbrite, ed., Hanser,
New York, 1987.
* F. Winnik and C.K.Ober, ?œColoured Particles by Dispersion Polymerization?? Eur. Polym. J., 23, 617 (1987).
1986
* C.K.Ober and T.L.Bluhm, ?œThermotropic Liquid
Crystalline Polyesters Containing Naphthalenic Mesogenic Groups??
Polym. Bull., 15, 233 (1986).
* C.K.Ober, F.Vangrunsven, M.McGrath and M.L.Hair,
?œPartitioning of Monomer During Dispersion Polymerization?? Colloids
& Surfaces, 21,347 (1986).
1985
* K. P.Lok and C. K. Ober, ?œParticle Size Control in
the Dispersion Polymerization of Polystyrene?? Can. J.Chem., 63, 209
(1985).
* C. K.Ober, K. P. Lok, and M. L. Hair,
?œMonodispersed, Micron-Sized Polystyrene Particles in Dispersion
Polymerization?? J. Polym. Sci.: Letters Ed., 23, 103 (1985).
1984
* Ch.K.Ober, J.-I. Jin, Q.F. Zhou and R.W.Lenz,
?œLiquid Crystal Polymers with Flexible Spacers in the Main Chain?? Adv.
Pol. Sci., 59, 103 (1984).
* E.Chiellini, G.Galli, R.W.Lenz and C.K.Ober,
?œMulticomponent Segmented Polyester Systems Containing Mesogenic
Residues?? in Polymer Blends, M.Kryszewski, A.Galeski and E.
Martuscelli, ed., Plenum, New York, NY (1984).
1983
* C.K.Ober, J.-I. Jin and R.W. Lenz, ?œLiquid Crystal
Polymers, 13. A Smectic Polyester with Triad Mesogenic Groups and
a Polymethylene Spacer in the Main Chain?? Makromol. Chem., Rapid
Commun., 4, 49 (1983).
* C.Ober, R.W.Lenz, G.Galli and E.Chiellini, ?œLiquid
Crystalline Polymers. 12. Polyesters with Either Alternating or
Random Orientation of Mesogenic Units?? Macromol., 16, 1034 (1983).
* J.-I.Jin, Y.-S.Chung, R.W.Lenz and C.K.Ober,
?œSynthesis and Properties of Thermotropic Compounds with Two Terminal
Mesogenic Units and a Central Spacer (II). Homologous Series of
α,?-Bis(4-p-substituted phenoxy¬ carbonyl)¬ phenoxy¬ alkanes?? Bull.
Kor. Chem. Soc., 4(3), 143 (1983).
1982
* J.-I. Jin, B.W. Jo, C. Ober and R.W.Lenz, ?œLiquid
Crystal Polymers. 9. Synthesis and Properties of Main Chain
Thermotropic Polyesters with Bromo- or
Methyl-p-phenylene-bis-terephthalate Mesogenic Units and Hexamethylene
Spacers?? Polymer (Korea), 2(6), 136 (1982).
* G.Galli, E.Chiellini, C.K.Ober and R.W.Lenz,
?œLiquid Crystalline Polymers, 8. Structurally Ordered Thermotropic
Polyesters of Glycol Ethers?? Makromol. Chem., 183, 2693 (1982).
* C.Ober, J.-I.Jin and R.W.Lenz, ?œLiquid Crystal
Polymers. V. Thermotropic Polyesters with Either Diad or Triad Aromatic
Mesogenic Units and Flexible Polymethylene Spacers in the Main Chain??
Polym. J. (Japan), 14, 9 (1982).
* G.Galli, P.Nieri, C.K.Ober and E.Chiellini,
?œPreparation and Properties of Mesomorphic Oligo(oxalates)s?? Makromol.
Chem., Rapid Commun., 3, 543 (1982).
* E. Chiellini, G.Galli, R.W.Lenz and C.K.Ober,
?œSegmented Polyesters for Biomedical Application: Synthesis and
Utilization in Semipermeable Membrane Manufacture?? Proc. IUPAC, IUPAC
28th Macromolecular Symposium, Oxford, UK (1982).
* Ober, Christopher Kemper. The synthesis and
characterization of some liquid crystalline polyesters based upon the
oxybenzoate-terephthalate mesogenic unit. (1982)
Avail. Univ. Microfilms Int., Order No. DA8219833., 250 pp. From:
Diss. Abstr. Int. B 1982, 43(4), 1125
1981
G. Galli, E. Chiellini, C. Ober and R.W. Lenz ,
?œPoliesteri di glicoeteri: sintesi e propriet?
liquido-cristalline?? La Chimica e L'industria, 63, 777 (1981).
G. Galli, P. Nieri, C. Ober and E. Chiellini,
?œPoliesteri di diacidi alifatici con α,?-diidrossiderivati capaci di
originare mesofasi orientate?? La Chimica e L'industria, 63, 777-778
(1981).
E.Chiellini, G.Galli, P.Nieri, R.W.Lenz and C.Ober,
?œPoliesteri Strutturalmente ordinati con propriet?
liquido-cristalline?? 5o Conv. Ital. Sci. Macromol., (Atti), 318
(1981).
* G. Galli, E. Benedetti, E. Chiellini, C. Ober and
R. W. Lenz, ?œPhase Transitions in Alkylene Glycol Terephthalate
Copolyesters Containing Mesogenic p-Oxybenzoate Units?? Polym. Bull.,
5, 497 (1981).
1980
* E.Chiellini, R.W.Lenz and C.K.Ober, ?œMulticomponent
Polyester Systems with Mesogenic Units??in Polymer Blends, E.
Martuscelli, R. Palumbo and M. Kryszewski, ed., Plenum, London (1980)
* J.-I. Jin, S. Antoun, C. Ober, and R.W.Lenz,
?œThermotropic Liquid Crystalline Polyesters with Rigid or Flexible
Spacer Groups?? British Polym. J., 12, 132 (1980).
1978
* A. Rudin, C.K.Ober and K.K.Chee, ?œFurther Comments
on a Falling Coaxial Cylinder Viscometer with Wide Shear Rate Range??
Rheol. Acta, 17, 312 (1978).